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Argon plasma

ICP-MS Inductively coupled plasma Argon plasma discharge... [Pg.177]

Gaseous sample introduction into an ICP-MS presents different problems. Owing to its extremely sensitive nature, Dean et al. [13] introduced the sample as the gaseous hydride by a flow-injection approach. This was reasonably effective because lower volumes of samples and reagents were in use. They utibzed nitric acid as a carrier stream to prevent the formation of argon chloride species in the plasma. Argon chloride has the same mass as arsenic which is mono-isotopic, and this severely bmits arsenic determination. An additional problem was that the sensitivity was extremely dependent on the purity of reagents. [Pg.146]

The basic set-up and compounds of an ICP-AES and ICP-MS are shown in Fig. 2. The ICP part is almost identical for AES and MS as detection principle. The ICP torch consists of three concentric quartz tubes, from which the outer channel is flushed with the plasma argon at a typical flow rate of 14 1 min-1. This gas flow is both the plasma and the cool gas. The middle channel transports the auxiliary argon gas flow, which is used for the shape and the axial position of the plasma. The inner channel encloses the nebulizer gas stream coming form the nebulizer / spray chamber combination. This gas stream transports the analytes into the plasma. Both the auxiliary and the nebulizer gas flow are typically around 1 1 min-1. The plasma energy is coupled inductively into the argon gas flow via two or three loops of a water-cooled copper coil. A radio frequency of 27.12 or 40.68 MHz at 1-1.5 kW is used as power source. The plasma is... [Pg.1000]

Much of the direct experimental information about the radicals and ions in the silane plasma comes from mass spectrometry. Fig. 2.9 ows the concentrations as a function of argon dilution for a typical low power plasma. Gallagher and Scott (1987) find that SiHj accounts for at least 80 % of the gas radicals in a pure silane plasma. Argon dilution increases the concentration of other radicals and these eventually dominate the plasma. [Pg.31]

Nishimura et al. also found that they could successfully inhibit carbon formation by adding hydrogen to the plasma argon. They were thus able to obtain a maximum yield of 40% acetylene while converting... [Pg.91]

Argon shield Argon for plasma Argon + sample... [Pg.90]

Spraying of ZrO(NO3)2 Solution into Plasma Argon, ultrahigh-temperature inductively coupled plasma. [Pg.543]

However, due to the sample introduetion into the plasma and the thereby occurring spectral and non-spectral interferences, the determination of palladium is not straightforward. The formation of molecular or doubly charged ions of matrix constituents or the plasma argon poses a considerable impediment. [Pg.222]

Spectral interferences are much more critical and can result from the spectra of argon, OH, bands and elements injected into the plasma. Argon emits lines only above 300 nm or in the far-UV. Therefore, no unknown lines can be assigned to argon in the range 165-300 nm. Although water is almost entirely... [Pg.223]

For the same treatment conditions the degree of cross-linking (estimated from the remaining gel fraction) is the same, for PE treated in situ, whatever the gas plasma (argon, oxygen or nitrogen) [110]. [Pg.667]

The instrument was run in the coUision/reaction mode using ammonia (NHj) gas to remove potential polyatomic interferences, because many of the transition elements are susceptible to spectral overlaps from ionic species generated by the plasma argon and the seawater matrix. The major instrument operating parameters are shown in Table 20.3. [Pg.264]


See other pages where Argon plasma is mentioned: [Pg.308]    [Pg.338]    [Pg.67]    [Pg.6089]    [Pg.6088]    [Pg.706]    [Pg.78]    [Pg.3]    [Pg.825]    [Pg.125]    [Pg.77]    [Pg.77]    [Pg.78]    [Pg.77]    [Pg.77]    [Pg.78]    [Pg.387]    [Pg.30]   
See also in sourсe #XX -- [ Pg.71 , Pg.72 ]

See also in sourсe #XX -- [ Pg.93 , Pg.98 ]

See also in sourсe #XX -- [ Pg.125 ]




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Argon plasma detector

Argon plasma emission

Argon plasma emission spectroscopy

Argon plasma etched

Argon plasma etching

Argon plasma flame

Argon plasma jet

Argon plasma treatment

Argon-ion laser plasma lines

Direct current argon plasma

Direct current argon plasma spectrometer

Electrode materials, sputtering argon plasma

Induction-Coupled Argon Plasma

Induction-Coupled Argon Plasma ICAP)

Inductively coupled argon plasma

Inductively coupled argon plasma emission spectrometer

Magnetic field argon plasma

Plasma argon-oxygen

Plasma hydrogen-argon

Reduced pressure argon plasma

Spectroscopy inductively coupled argon plasma

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