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2020 – today
- 2024
[c5]Tibor Grasser, Maximilian W. Feil, Katja Waschneck, Hans Reisinger, Judith Berens, Dominic Waldhör, A. Vasilev, Michael Waltl, Thomas Aichinger, M. Bockstedte, Wolfgang Gustin, Gregor Pobegen:
A Recombination-Enhanced-Defect-Reaction-Based Model for the Gate Switching Instability in SiC MOSFETs. IRPS 2024: 3- 2023
- [c4]Maximilian W. Feil
, Katja Waschneck, Hans Reisinger, Judith Berens, Thomas Aichinger, Paul Salmen, Gerald Rescher, Wolfgang Gustin, Tibor Grasser:
Towards Understanding the Physics of Gate Switching Instability in Silicon Carbide MOSFETs. IRPS 2023: 1-10 - 2022
- [c3]Maximilian W. Feil, Hans Reisinger, André Kabakow, Thomas Aichinger, Wolfgang Gustin, Tibor Grasser:
Optical Emission Correlated to Bias Temperature Instability in SiC MOSFETs. IRPS 2022: 3
2010 – 2019
- 2018
- [j8]Christian Schlünder, Katja Puschkarsky, Gunnar Andreas Rott, Wolfgang Gustin, Hans Reisinger:
NBTI: Experimental investigation, physical modelling, circuit aging simulations and verification. Microelectron. Reliab. 82: 1-10 (2018) - [c2]Katja Puschkarsky, Hans Reisinger, Christian Schlünder, Wolfgang Gustin, Tibor Grasser:
Fast acquisition of activation energy maps using temperature ramps for lifetime modeling of BTI. ESSDERC 2018: 218-221 - [c1]Katja Puschkarsky, Tibor Grasser, Thomas Aichinger, Wolfgang Gustin, Hans Reisinger:
Understanding and modeling transient threshold voltage instabilities in SiC MOSFETs. IRPS 2018: 3 - 2016
- [j7]Christian Schlünder, Jörg Berthold, Fabian Proebster, Andreas Martin, Wolfgang Gustin, Hans Reisinger:
Degradation and recovery of variability due to BTI. Microelectron. Reliab. 64: 179-184 (2016) - 2014
- [j6]C. Olk, Stefano Aresu, R. Rudolf, M. Röhner, Wolfgang Gustin, E. Stein Von Kamienski:
HCS degradation of 5 nm oxide high-voltage PLDMOS. Microelectron. Reliab. 54(9-10): 1883-1886 (2014) - [j5]Gunnar Andreas Rott, Karina Rott, Hans Reisinger, Wolfgang Gustin, Tibor Grasser:
Mixture of negative bias temperature instability and hot-carrier driven threshold voltage degradation of 130 nm technology p-channel transistors. Microelectron. Reliab. 54(9-10): 2310-2314 (2014) - 2012
- [j4]Karina Rott, Hans Reisinger, Stefano Aresu, Christian Schlünder, Klaus Kölpin, Wolfgang Gustin, Tibor Grasser:
New insights on the PBTI phenomena in SiON pMOSFETs. Microelectron. Reliab. 52(9-10): 1891-1894 (2012)
2000 – 2009
- 2008
- [j3]Stefano Aresu, Reinhard Pufall, Michael Goroll, Wolfgang Gustin:
NBTI on smart power technologies: A detailed analysis of two concurrent effects using a re-examined on-the-fly technique. Microelectron. Reliab. 48(8-9): 1310-1312 (2008) - [j2]Michael Goroll, Reinhard Pufall, Stefano Aresu, Wolfgang Gustin:
New aspects for lifetime prediction of bipolar transistors in automotive power wafer technologies by using a power law fitting procedure. Microelectron. Reliab. 48(8-9): 1509-1512 (2008) - 2005
- [j1]Christian Schlünder, Ralf Brederlow, Benno Ankele, Wolfgang Gustin, Karl Goser, Roland Thewes:
Effects of inhomogeneous negative bias temperature stress on p-channel MOSFETs of analog and RF circuits. Microelectron. Reliab. 45(1): 39-46 (2005)
Coauthor Index
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