Abstract: The fabrication of magnetic recording heads is briefly described and compared with the fabrication of semiconductor integrated circuits.
For reactive ion etching, chemical aspects of the etching of materials commonly used in recording heads are reviewed, and some relevant examples are discussed.
Chemical aspects of the etching of nickel-iron, copper, hardbaked resist, aluminum oxide, tantalum, and titanium carbide/aluminum oxide substrate are reviewed
Fabrication of magnetic recording heads and dry etching of head materials // IBM Journal of Research and Development. 1999. Vol. 43. No. 1.2. pp. 89-102.
The fabrication of magnetic recording heads is briefly described and compared with the fabrication of semiconductor integrated circuits. Relevant dry-etching ...
A method of manufacturing a magnetic head manufactures a magnetic head having a base, and a laminate stacked on the base and including a magneto-resistive ...
This paper aim to investigate the etch selectivity of substrate to hard metal mask which have high potential that significantly to increase the etch selectivity ...
Missing: recording | Show results with:recording
A manufacturing method of a magnetic head includes a process for forming a lift-off mask pattern on a magnetoresistance effect element, such that the upper ...
We review vacuum deposition technology for the fabrication of readers of thin film magnetic heads. We consider three different parts of the deposition, ...
Missing: dry | Show results with:dry
Fabrication of magnetic recording heads and dry etching of head materials. ... Design, fabrication, and performance of spin-valve read heads for magnetic ...