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Mirko Fraschke | IEEE Xplore Author Details

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Publication Topics. Reactive Ion Etching,BiCMOS Technology,Dry Etching,Etching Rate,MEMS Switches,Metal Layer,Reactive Ion Etching Process,Silicon Photonics ...

Mirko Fraschke IHP | Institute for High Performance Microelectronics

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Mirko FRASCHKE | Cited by 1118 | of IHP, Frankfurt (Oder) (Institute for High Performance Microelectronics) | Read 44 publications | Contact Mirko FRASCHKE.

Mirko Fraschke - dblp

dblp.org › Persons
Apr 25, 2024 · List of computer science publications by Mirko Fraschke.
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Functionalized Back-End Devices for (Bi)CMOS Circuits - IOPscience

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Functionalized Back-End Devices for (Bi)CMOS Circuits, Christian Wenger, Christian Walczyk, Damian Walczyk, Mindaugas Lukosius, Mirko Fraschke, Dirk Wolansky,

Tungsten grid enhanced thin-film wafer-level encapsulation for ...

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In this study, a tungsten grid has been developed as enhanced encapsulation for monolithically integrated mm-wave RF-MEMS switches in the Back-End-Of-Line ...

InP-Si BiCMOS Heterointegration Using a Substrate Transfer Process

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InP-Si BiCMOS Heterointegration Using a Substrate Transfer Process, Marco Lisker, Andreas Trusch, Andreas Krüger, Mirko Fraschke, Philipp Kulse, Yevgen ...

Novel designs of SAW devices for highly sensitive chemical sensors

www.sciencedirect.com › article › pii
Santos, Dirk Wolansky, Alexander Scheit, Mirko Fraschke, Christian Wipf, Peter Zaumseil, and Christian Wenger. “Monolithic integrated SAW filter based on ...

Mirko Fraschke - Prozessingenieur RIE-Trockenätzverfahren - IHP GmbH

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Mirko Fraschke from www.xing.com
Berufserfahrung von Mirko Fraschke · Bis heute 16 Jahre und 3 Monate, seit Aug. 2008. Prozessingenieur RIE-Trockenätzverfahren. IHP GmbH · 2 Jahre und 8 Monate, ...

3D AFM scan of 5 11m x 5 11m AIN surface. - ResearchGate

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Mirko Fraschke · Dirk Wolansky · Christian Wenger. A CMOS compatible AlN/SiO2/Si3N4/Si(100) surface acoustic wave (SAW) device ...