ARTICLE
|
doi:10.20944/preprints202306.1820.v1
Subject:
Engineering,
Industrial And Manufacturing Engineering
Keywords:
Photolithography; Optimal Design of Experiments; Optimal Experimental Design; D-optimal; G-Optimal; A-Optimal; Control Algorithm; Optimization; Genetic Algorithms; Compound Criteria
Online: 26 June 2023 (14:02:17 CEST)
ARTICLE
|
doi:10.20944/preprints202409.1046.v1
Subject:
Computer Science And Mathematics,
Other
Keywords:
Overlay Modeling; Photolithography; Parameters Tuning; EUV lithography; Semiconductor Manufacturing; Yield Results
Online: 13 September 2024 (08:24:36 CEST)