Vishal: Advanced Semiconductor Lab King Abdullah University of Science and Technology (KAUST) Thuwal, Saudi Arabia 23955

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HfO2 Dielectric Breakdown Study

Vishal

Advanced Semiconductor Lab


King Abdullah University of Science and Technology (KAUST)
Thuwal, Saudi Arabia 23955
HfO2 Dielectric (Feb. 2022)

4.00E-09

3.00E-09
I(A)

2.00E-09

1.00E-09

0.00E+00

-5 0 5 10 15
V(Volt)

Xiaohang Li
Current Condition(At Different Voltage Bias)

5.00E-11
1.00E-10

4.00E-11

3.00E-11 5.00E-11

2.00E-11
I(A)

I(A)
0.00E+00
1.00E-11

0.00E+00 -5.00E-11

-1.00E-11

-1.00E-10
-2.00E-11

-1.0 -0.5 0.0 0.5 1.0 -2 -1 0 1 2


V(Volt) V(Volt)

Xiaohang Li
Current Condition(At Different Voltage Bias)

2.00E-10 2.00E-10

0.00E+00
1.00E-10

-2.00E-10
0.00E+00

I(A)
-4.00E-10
I(A)

-1.00E-10
-6.00E-10

-2.00E-10 -8.00E-10

-1.00E-09
-3.00E-10

-3 -2 -1 0 1 2 3
-1.20E-09
-4 -2 0 2 4
V(Volt)
V(Volt)

• Upto 4V, It is showing very small current (<1E-9A)


Xiaohang Li
Current Condition(At Different Voltage Bias)

3E-6
• At 5V, It shows microamps current.
I(A)

-3E-6

-6 -4 -2 0 2 4 6
V(Volt)

Xiaohang Li
Complete Breakdown

2E-6
• Once Dielectric breakdown at 5 V then
it is showing a high current even at 1 V.
So It is a “complete breakdown.”
I(A)

7E-7
-1.0 -0.5 0.0 0.5 1.0
V(Volt)

Xiaohang Li

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