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    Thin Film Deposition Techniques

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    Shayan Ahmad Khattak, BS Physics Student, UoP
    Thin film deposition is a process that applies a very thin layer between 1 nm to 100 micrometers onto a substrate. There are several thin film deposition techniques but they are generally divided into physical vapor deposition (PVD) and chemical vapor deposition (CVD). PVD is a common technique that involves evaporating a solid source material into vapor phase using methods like thermal evaporation or sputtering and then condensing it onto the substrate. Thin film deposition has many applications in industries like semiconductor, solar panels, medical devices, and optics due to properties like uniform surfaces, desired electrical and optical properties, and corrosion resistance.

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    Thin Film Deposition Techniques

    Uploaded by

    Shayan Ahmad Khattak, BS Physics Student, UoP
    97 views20 pages
    Thin film deposition is a process that applies a very thin layer between 1 nm to 100 micrometers onto a substrate. There are several thin film deposition techniques but they are generally divided into physical vapor deposition (PVD) and chemical vapor deposition (CVD). PVD is a common technique that involves evaporating a solid source material into vapor phase using methods like thermal evaporation or sputtering and then condensing it onto the substrate. Thin film deposition has many applications in industries like semiconductor, solar panels, medical devices, and optics due to properties like uniform surfaces, desired electrical and optical properties, and corrosion resistance.

    Original Description:

    some techniques used in Nano technology

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    Thin film deposition is a process that applies a very thin layer between 1 nm to 100 micrometers onto a substrate. There are several thin film deposition techniques but they are generally divided into physical vapor deposition (PVD) and chemical vapor deposition (CVD). PVD is a common technique that involves evaporating a solid source material into vapor phase using methods like thermal evaporation or sputtering and then condensing it onto the substrate. Thin film deposition has many applications in industries like semiconductor, solar panels, medical devices, and optics due to properties like uniform surfaces, desired electrical and optical properties, and corrosion resistance.

    Copyright:

    © All Rights Reserved
    Download as PPTX, PDF, TXT or read online from Scribd
    Download as pptx, pdf, or txt
    97 views20 pages

    Thin Film Deposition Techniques

    Uploaded by

    Shayan Ahmad Khattak, BS Physics Student, UoP
    Thin film deposition is a process that applies a very thin layer between 1 nm to 100 micrometers onto a substrate. There are several thin film deposition techniques but they are generally divided into physical vapor deposition (PVD) and chemical vapor deposition (CVD). PVD is a common technique that involves evaporating a solid source material into vapor phase using methods like thermal evaporation or sputtering and then condensing it onto the substrate. Thin film deposition has many applications in industries like semiconductor, solar panels, medical devices, and optics due to properties like uniform surfaces, desired electrical and optical properties, and corrosion resistance.

    Copyright:

    © All Rights Reserved
    Download as PPTX, PDF, TXT or read online from Scribd
    Download as pptx, pdf, or txt
    of 20

    Thin Film Deposition Techniques

    Presented by : Mr. SHAYAN AHMAD KHATTAK


    What we are going to learn ?

    • What is Thin Film Deposition .

    • Why we use this technique .

    • Some different Methods for this technique .


    Historical background

    To

    Gold Beating & Gilding Advanced Technology

    By (Flexible Displays)

    Egyptians (1567-1320 B.C) Very Thin material


    From Bulk to Nano Scale

    •Properties of the Materials changes on moving from


    Bulk (Macro) scale to Nano scale.
    • Gold seems Red Instead of yellow at Nano level.
    INTRODUCTION
    Thin Film deposition is a process of applying a very thin layer of about

    Nano-meters (nm)  100 micro-meters (mm)

    On to a substrate material .

    A Simple Example:

    Why We Eat jam on bread ?

    Of course because it tastes good ...


    Similarly, we Coat different layers on different Materials to obtain different desired
    properties.

    Just like we use Butter instead of jam to Experience different taste …

    Omg That’s yummy Too … 😁


    Purpose of using this Technique

    Aims of using this technique is vast enough & can vary although some of the highlighted
    ones are :

    • To maintain the surface Uniformity.

    • To achieve desired Electrical & Opto-electrical properties.

    • To achieve rust free & corrosion free surfaces.

    • To decrease the weight & bulkiness of the material.

    • To achieve Superior functional Medical coatings.


    Applications

    We use this process mainly in Semi-Conductor Industry i.e


    • Solar Panels
    • CD’s
    • Disk Drive
    • Optical Devices
    • Medical Devices
    Also have useful applications in
    Optics ,Space science & defense.

    etc ….
    Different deposition techniques
    (Methods)

    Þ We use different deposition techniques to generate different features in substrate.

    Þ The properties & versatility mainly depends on the technique we will apply.

    So , The selection of deposition Technique is very important part of the process.

    Þ we cannot use same deposition technique for all types of material or substrate.
    Types

    There are Several types of deposition techniques but Generally it is divided into two main types i.e

    • Physical vapour deposition (PVD)

    • Chemical vapour deposition (CVD)


    Classification Diagram
    The process of Vapour deposition:

    This process involves the deposition of thin films Or layers of a Material onto a Substrate
    by atom by atom Or Molecule By Molecule .

    • The source material is evaporated to get into vapourized Phase

    & than condenses onto substrate to form a layer.

    • The whole process is performed in a vacuum.


    Purpose of this process

    • Less Contamination.

    • Low pressure plasma conditions .

    • Composition of the gas & vapour can be easily controlled.

    • Flow of vapours can also be controlled.


    Physical vapour deposition

    • It is a way of coating a thin film (pure metals, metallic alloys, ceramics )


    on a substrate .
    • Thickness usually ranges from 1 (um) to 10 (um).

    Steps Involved:

    Solid
    Source Evap
    orati
    o n
    Vapour
    Tran
    sp orta
    Phase ti on

    Condensed
    on
    Substrate
    Why PVD ?

    • PVD can convert solid materials into vapour phase without chemical

    processes.

    •They are very Convenient & easy to deposit many types of materials.

    •The range of deposition (thickness) by PVD is of few nm’s to thousand of

    nm’s.

    •The substance range (substrate) in size can be from very small to very large.

    •Typical PVD deposition rates are 1-10 nm/sec.


    Classification of PVD

    PVD technique can be classified on the type of technique used to evaporate the solid source Material into Vapour

    Phase.

    These are

    • Thermal evaporation.

    • Sputtering.
    Thermal Evaporation

    Involves the evaporation of source material by means of High current filament


    Sputtering

    • When a surface is bombarded with high velocity

    positive ions, it is possible to cause ejection of the

    surface atoms.

    • This process of ejection atoms from the surface by

    bombardment of positive ions ( usually inert

    gas ions), by momentum transfer process between

    the sputter gas& target atom is commonly known as

    sputtering (cathode sputtering)

    • (Ar) is commonly used as sputtering gas.


    Sputtering
    Thank you !

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