"Overlay-Aware Detailed Routing for Self-Aligned Double Patterning ..."

Iou-Jen Liu, Shao-Yun Fang, Yao-Wen Chang (2014)

> Home

Details and statistics

DOI: 10.1145/2593069.2593176

access: closed

type: Conference or Workshop Paper

metadata version: 2018-11-06

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/dac/LiuFC14
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/dac/LiuFC14
Iou-Jen Liu, Shao-Yun Fang, Yao-Wen Chang:
Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process. DAC 2014: 50:1-50:6

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.