"Ultrathin Gate Dielectric Enabled by Nanofog Aluminum Oxide on Monolayer MoS2."

Jung-Soo Ko et al. (2023)

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DOI: 10.1109/ESSDERC59256.2023.10268527

access: closed

type: Conference or Workshop Paper

metadata version: 2023-10-19

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Jung-Soo Ko, Zichen Zhang, Sol Lee, Marc Jaikissoon, Robert K. A. Bennett, Kwanpyo Kim, Andrew C. Kummel, Prabhakar Bandaru, Eric Pop, Krishna C. Saraswat:
Ultrathin Gate Dielectric Enabled by Nanofog Aluminum Oxide on Monolayer MoS2. ESSDERC 2023: 1-4

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