"Fast lithographic mask optimization considering process variation."

Yu-Hsuan Su et al. (2014)

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DOI: 10.1109/ICCAD.2014.7001357

access: closed

type: Conference or Workshop Paper

metadata version: 2017-06-04

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  - https://dblp.org/rec/conf/iccad/SuHTCB14
Yu-Hsuan Su, Yu-Chen Huang, Liang-Chun Tsai, Yao-Wen Chang, Shayak Banerjee:
Fast lithographic mask optimization considering process variation. ICCAD 2014: 230-237

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