"An environmentally friendly solution-processed ZrLaO gate dielectric for ..."

Yuxiao Fang et al. (2021)

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DOI: 10.1109/ICICDT51558.2021.9626540

access: closed

type: Conference or Workshop Paper

metadata version: 2023-06-19

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Yuxiao Fang, W. Y. Xu, Ivona Z. Mitrovic, Li Yang, Chun Zhao, Cezhou Zhao:
An environmentally friendly solution-processed ZrLaO gate dielectric for large-area applications in the harsh radiation environment. ICICDT 2021: 1-4

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