"Run-to-Run Control of Thermal Atomic Layer Deposition."

Yichi Zhang et al. (2020)

> Home

Details and statistics

DOI: 10.1109/MED48518.2020.9183059

access: closed

type: Conference or Workshop Paper

metadata version: 2024-01-19

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/med/ZhangDWC20
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/med/ZhangDWC20
Yichi Zhang, Yangyao Ding, Zhe Wu, Panagiotis D. Christofides:
Run-to-Run Control of Thermal Atomic Layer Deposition. MED 2020: 1080-1086

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.