"Doping profile modification approach of the optimization of HfO x based ..."

Yi Hou et al. (2015)

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DOI: 10.1007/S11432-015-5283-0

access: closed

type: Journal Article

metadata version: 2020-03-02

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  - https://dblp.org/rec/journals/chinaf/HouCCZLKC15
Yi Hou, Bing Chen, Zhe Chen, Feifei Zhang, Lifeng Liu, Jinfeng Kang, Yuhua Cheng:
Doping profile modification approach of the optimization of HfO x based resistive switching device by inserting AlO x layer. Sci. China Inf. Sci. 58(6): 1-7 (2015)

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