"Titanium dioxide (TiO2)-based gate insulators."

Stephen A. Campbell et al. (1999)

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DOI: 10.1147/RD.433.0383

access: closed

type: Journal Article

metadata version: 2020-03-13

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  - https://dblp.org/rec/journals/ibmrd/CampbellKGHMG99
Stephen A. Campbell, Hyeon-Seag Kim, David C. Gilmer, Boyong He, Tiezhong Ma, Wayne L. Gladfelter:
Titanium dioxide (TiO2)-based gate insulators. IBM J. Res. Dev. 43(3): 383-392 (1999)

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