"Controlled Wafer Release in Clustered Photolithography Tools: Flexible ..."

Kyungsu Park, James R. Morrison (2015)

> Home

Details and statistics

DOI: 10.1109/TASE.2014.2311997

access: closed

type: Journal Article

metadata version: 2020-04-02

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/tase/ParkM15
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/tase/ParkM15
Kyungsu Park, James R. Morrison:
Controlled Wafer Release in Clustered Photolithography Tools: Flexible Flow Line Job Release Scheduling and an LMOLP Heuristic. IEEE Trans Autom. Sci. Eng. 12(2): 642-655 (2015)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.