Sample Preparation 2 Handouts PDF
Sample Preparation 2 Handouts PDF
Sample Preparation 2 Handouts PDF
preparation
5th CEMM workshop
Bulk material
Surface
Hard samples Imaging SE and BSE
topography (SE) Some samples are smooth
and have a mirror surface.
SEM
CENTER FOR ELECTRON MICROSCOPY AND MICROANALYSIS
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Make sure that the selected
Cutting part is representing the whole
sample.
Bulk material
Hard samples grinding
SEM
CENTER FOR ELECTRON MICROSCOPY AND MICROANALYSIS
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Bulk material
Hard samples
Image: Jeol
CENTER FOR ELECTRON MICROSCOPY AND MICROANALYSIS
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Bulk: soft and firm material
Biological samples, paper, polymers, foams, gels, wood, food, …
chemical vapour
Bulk material Images: Dunn school
Surface observation – as it is
The sample is fixated, dyhidrated and dry
CENTER
Image:FOR ELECTRON MICROSCOPY AND MICROANALYSIS
SCAN
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Powders
Powders, colloids and magnetic particles
Ion beam
Cleaning or etching
• ion etching
• bench-top instrument
• broad beam - 1 cm2 area
• Beam energy: 1 – 10 keV
• Carbon:
• for particles and powder
• for EDS, BSE
• Contamination of source
materials- use high purity of (Image: wiki)
source material
• Contamination of the heater -
use material with low diffusion
• Residual gas in the chamber-
better vacuum, higher deposition
rate
(Image: lasp)
S depends on:
1. type of target atom and the binding energy
2. relative masses (of ions and atoms)
3. angle of incidence of ions and kinetic energy
Magnetron target (Au, Pt) demonstrating racetrack erosion profile PECS targets (Cr, Au/Pd, C and Pt)
(Image: wiki)
(Image: l-w)
0,1A
0.4 nm nominal film thickness (magnetron sputter) coatings produced at room temperature at low vacuum conditions