Semi Conducting Materials Misfit Dislocations March 6 2012
Semi Conducting Materials Misfit Dislocations March 6 2012
Semi Conducting Materials Misfit Dislocations March 6 2012
MT41016
Two cubic crystals with lattice constants a1 = 1 units and a2 = 1.05 units (i.e. a misfit of 5%) form a phase boundary interface.
Two cubic crystals with lattice constants a1 = 1 units and a2 = 1.05 units (i.e. a misfit of 5%) form a phase boundary interface.
Between the dislocation lines the interface is coherent; a phase boundary with misfit dislocations is called semi-coherent. Misfit dislocations - in contrast to general grain boundary dislocations must have an edge component that accounts for the lattice constant mismatch
Phase boundary dislocations -misfit dislocations are only a subset), "simple" misfit dislocations are the dominant defects in technologically important man-made phase boundaries. Misfit dislocations are not restricted to boundaries between two chemically different types of materials. Silicon heavily doped with, e.g., Boron, has a slightly changed lattice constant and thus formally can be seen as a different phase. The rather ill defined interface between a heavily doped region and an undoped region thus may and does have misfit dislocations, an example is given in the illustration.
Misfit Dislocations
The geometry is also not too well defined, because there is no abrupt change of lattice constants as in the case of phase boundaries between chemically different phases. The lattice constant changes continuously following the B-concentration which obeys some diffusion profile.
Optoelectronics includes all semiconductor devices which emit light through recombination of electrons and holes. Prime materials are GaAs, GaAlAs, GaP, InSb and generally all III - V semiconductors, but also GaN or SiC. In making optoelectronic devices, defect engineering is needed. Diffusion plays a major role; the precise atomic mechanisms are not too well understood at present. Defects in interfaces (= phase boundaries between different optoelectronic materials) play a major role; they essentially limit or prohibit applications in many cases. In contrast to Si microelectronics, defects may also play a role in the finished device while it is in operation. Dislocations, not wholly unavoidable in most III - V materials, may start to climb and degrade the function. Early Lasers diodes, e.g., stopped working after few hours of operation because defects evolved that served as recombination centers impeding radiant recombination.
Look at the picture and try to grasp the concept. But don't forget
1. There is no such crystal in nature: All real lattices are more complicated. 2. The exact structure of the dislocation will be more complicated. Edge dislocations are just an extreme form of the possible dislocation structures, and in most real crystals would be split into "partial" dislocations and look much more complicated.
First, we look at a simplified but principally correct rendering of the connection between dislocation movement and plastic deformation - the elementary process of metal working which contains all the ingredients for a complete solution of all the riddles and magic of the smiths art.
Shift of the upper half of the crystal after the dislocation emerged
Misfit Dislocations
Misfit Dislocations
Left picture: Make a closed circuit that encloses the dislocation from lattice point to lattice point (later from atom to atom). You obtain a closed chain of the base vectors which define the lattice.
Right picture: Make exactly the same chain of base vectors in a perfect reference lattice. It will not close.
The special vector needed for closing the circuit in the reference crystal is by definition the Burgers vector b. But beware! As always with conventions, you may pick the sign of the Burgers vector at will. In the version given here (which is the usual definition), the closed circuit is around the dislocation, the Burgers vector then appears in the reference crystal. You could, of course, use a closed circuit in the reference crystal and define the Burgers vector around the dislocation. You also have to define if you go clock-wise or counter clock-wise around your circle. You will always get the same vector, but the sign will be different! And the sign is very important for calculations! So whatever you do, stay consistent!. In the picture above we went clock-wise In both cases.
You notice that here we chose to go clock-wise - for no particularly good reason.
The Burgers vector is parallel to the dislocation line direction.
If you imagine a walk along the non-closed Burgers circuit, which you keep continuing round and round, it becomes obvious how a screw dislocation got its name.
Between the dislocation lines the interface is coherent; a phase boundary with misfit dislocations is called semi-coherent. Misfit dislocations - in contrast to general grain boundary dislocations must have an edge component that accounts for the lattice constant mismatch
Thicker layers are energetically better off with a dislocation network, thinner
Somewhat later in 1974 Matthews and Blakeslee reconsidered the situation and looked at the forces needed to move a few pre-existing dislocations into the interface in order to form the misfit dislocation network.
Misfit Dislocations
(1 + ) = 2. . f . (1 )
[1]
The energy of the system involving a strained epilayer and an array of misfit dislocations is generally discussed for the case of the layer and matrix material being cubic, and the interface parallel to a cube plane.
eh b 2 2. ln 4 (1 ) p r0
[2]
where h is the film thickness, r0 the core radius, and where the factor 2 arises because of the presence of two orthogonal sets of edge dislocations. The elastic strain remaining is given by:
b =f p
where the first term is the elastic strain energy. For a given thickness the minimum energy occurs for a value 0 given by:
(1 + ) 2 h + b( f ) ln eh E = 2 (1 ) 2 (1 ) r0
eh b 0 = ln 8h(1 + ) r0
[3]
[4]
If 0 > f, then the layer is ideally commensurate with the substrate, and the elastic strain is equal to f. If 0 < f then some misfit will be relaxed by dislocations, the spacing being given by (5) with 0 = f - b/p. The critical film thickness, hc , at which it becomes energetically favourable for the first dislocation to be introduced is obtained with 0 = f, i.e.
ehc b hc = ln 8f (1 + ) r0
[5]
ehc b ln hc = 8f (1 + ) r0
Two points should be made about this relation.
[5]
First, hc depends on the core radius r0 ( b), and the uncertain value of this parameter introduces some uncertainty into this relation, particularly for small h/r0. Secondly, hc depends on the assumed dislocation arrangement; for example the misfit might be relieved by dislocations with different b; eqn. (2) shows that the dislocation strain field energy is smaller for edge dislocations of smaller energy, even though for the same relief of strain (f - ), the spacing p will be smaller.
eh b 2 2. ln 4 (1 ) p r0
[2]
Thus it is necessary to take care in making comparisons between theory and experiment. In practice, however, it is generally found that the observed values of hc are larger than those predicted over most of the range of misfits (see for example People and Bean [6] for Ge-Si layers on (100) Si). The reasons for this discrepancy are partly due to insensitivity of the experimental techniques used, and partly kinetic in origin. In order to introduce dislocations, there have to be mechanisms for doing so, and for most practical cases, except these with very large misfits, the strain relief is limited by kinetic considerations.
a) Interstitial impurity atom, b) Edge dislocation, c) Self interstitial atom, d) Vacancy, e) Precipitate of impurity atoms, f) Vacancy type dislocation loop, g) Interstitial type dislocation loop, h) Substitutional impurity atom
Misfit Dislocations
(1 )
(1 + ) 2 h + b( f ) ln eh (1 ) 2 (1 ) r0
critical thickness hc (eq. 5)? After all, the critical thickness can not possibly depend on the thickness itself.
Well, if you want to know, turn to the annotated version of Sir Peters paper.
ehc b ln hc = 8f (1 + ) r0
1. Introduction In 1949 Frank and van der Merwe discussed theoretically the stresses and the energies at the interface of an epitaxial layer grown on a matrix with a slightly different lattice parameter. Their one-dimensional model was extended to two dimensions by Jesser et al. These studies show that if the lattice mismatch is small, and/or the thickness of the overlayer is not large, the growth of the epilayer is pseudomorphic commensurate) with the matrix, with the atomic planes on the two sides of the interface being in perfect register with each other. The mismatch is accommodated by an elastic strain in the epilayer giving a biaxial stress of:
2 f .(1 + ) = 1
2 f .(1 + ) = 1
where is the shear modulus, is the Poisson's ratio and f the misfit parameter. Elastic isotropy is assumed. The misfit parameter is given by f = (ae -am)/am, where ae , am are the lattice parameters of the unconstrained epilayer and matrix in the plane parallel to the interface. How did he get this formula? Well, this is easy, but deriving the starting formula also illustrates a certain problem one might encounter from looking at simple pictures all the time. Let's see:
If you strain the lattice of the epitaxial layer in one dimension, so that it
Misfit Dislocations
The strain needed for perfect fit is = (ae am)/ae; but since ae and am are nearly equal, dividing by ae (as is correct) or by am (as Sir Peter does) makes no difference. So we can equate with f = (ae am)/am, the misfit parameter according to Sir Peter.
Misfit = (a a The strain needed for perfect fit is Dislocations)/ae; but since ae and am are e m
= E. with E = modulus of elasticity (Youngs modulus). But since E can be expressed in terms of the shear modulus and Poissons ratio by E=2(1+), we can write = 2(1+). = 2(1+). f Apart from the factor (1 ), this is Sir Peters starting formula. Where does the (1 ) term come from?
Let's look at the problem carefully. We actually have a two-dimensional problem and must consider biaxial stress. Our simple figure was one-dimensional - and that is where we might have missed something. Did we miss something? Well, yes - we did.
1 = 1,2 (1 )
1 = 1,2 (1 )
eh b 2 2. ln 4 (1 ) p r0
where h is the film thickness, r0 the core radius, and where the factor 2 arises because of the presence of two orthogonal sets of edge dislocations. First, there is a slight correction in eqn (2): The "x" after the "2" as shown in the original has been replaced by a dot - because the "", written as "x" as a sign for multiplication is no longer allowed; it has been used up as denoting the amount of Ge in the alloy GexSi 1 x.
Now the formula contains an unexplained "e". Since we know that the energy of a dislocation contains the term ln(R/r0) with R being some outer radius, it is clear that R cannot be larger than h, the thickness of the layer. But by simply equating R with h, we make some numerical mistake which we might correct by introducing a unspecified (but probably not very large) correction factor e?
That was the first thought. Well - wrong! Sir Peter simply takes one of the
many formulas for the total energy of a dislocation that float around, it is the same formula as shown before (for the purpose of recalling it here), and e is e indeed - the base for natural logarithms.
The general formula for the dislocation energy gives the energy per unit length
of the dislocation. If we want the energy per unit area, we have to multiply by the length of the dislocations in a unit area and then divide by the unit area. If we take the unit area to be p2, the areas of one cell of the (square) dislocation network, it contains dislocations with the length 2p we have the factor 2/p.
= f b/p.
This is something easy to figure out for yourself. Just take into account that every dislocation with a Burgers vector b relaxes the total deformation by one b (provided it is fully contained in the plane of the boundary).
Full relaxation thus would occur if a misfit dislocation network with a spacing The essential trick is to generate a variable e which is the residual strain
contained in a partially relaxed epitaxial layer. So some of the strain and its energy is gone, but at a cost: Dislocations, carrying their own energy penalty, are introduced.
p = b/f = b/(ae am)/am is introduced which partially relaxes the epitaxial layer.
Since is a variable, it can now be used to optimize the system as we will see.
The total energy per unit area E is then given by
(1 + ) 2 b( f ) eh E = 2 ln h+ (1 ) 2 (1 ) r0
where the first term is the elastic strain energy.
(3)
= f b/p, or p = b/ (f ).
The next part is straight forward. The total energy per unit area is a function
of , the strain still present in the epitaxial layer even after some dislocations have been introduced. So we can find the minimum energy of the system with respect to by calculating dE/d = 0. The calculation is straight forward: For a given thickness the minimum energy occurs for a value 0 given by
For a given thickness the minimum energy occurs for a value 0 given by
If 0 = f, then the layer is ideally commensurate with the substrate, and the elastic strain is equal to f. If 0 < f, then some misfit will be relaxed by dislocations, the spacing being given by (5) with 0 = f b/p. The critical film thickness, hc , at which it becomes energetically favourable for the first dislocation to be introduced is obtained with 0 = f, i.e.
Misfit Dislocations
eh b 0 = ln 8h(1 + ) r0
(4)
ehc b hc = ln 8f (1 + ) r0
Got it? Well, lets look at the argumentation in detail?
(5)
If the remaining strain 0 = f, then it is the strain of the unrelaxed layer and
the formula defining yields b/p = 0 which, since b has a defined value, can only mean p is infinite - in other words there is no dislocation network.
If 0 > f, the layer is not ideally commensurate with the substrate as stated in
the original, but a dislocation network must be present (b/p < 0 is required) which increases the strain - the sign of b is the wrong way around. This is of course a totally unphysical high energy situation, and we can safely exclude 0 > f, from the possible range of e values.
If 0 < f, again a dislocation network must be present, but this time with the
right sign of b - it decreases the total elastic strain.
If the thickness is below hc we have no dislocations and = f obtains. If the thickness is above hc, we have dislocations and = f obtains.
This leaves us with 0 = f at the point of critical thickness. All we have to do now is to express the equation above for h; it will then give hc by substituting f for 0. Sir Peter now writes
ehc b hc = ln 8f (1 + ) r0
hc depends on the core radius r0 ( b), and the uncertain value of this
parameter introduces some uncertainty into this relation, particularly for small h/r0.
hc depends on the assumed dislocation arrangement; for example the misfit might be relieved by dislocations with different b; eqn. (2) shows that the
dislocation strain field energy is smaller for edge dislocations of smaller energy, even though for the same relief of strain (f ), the spacing p will be smaller.
+ ) 30,
b/6 f.
b hc 9.9 f
So if your misfit is 1% (f = 0.01), your critical thickness will be roughly around 10 b. Burger vectors usually are b = a/2<110> or b = a/22 which is around 0.3 nm. This gives hc 3 nm - which is not all that much! Fortunately, as Sir Peter points out in the remainder of the article, the critical thicknesses observed are usually considerably larger than the calculated ones.
ehc b hc = ln 8f (1 + ) r0
With b = Burgers vector of the misfit dislocations (actually only their edge component in the plane of the interface), f = misfit parameter, i.e a/a, e = 2.7183... = base of natural logarithms, and r0 = core radius of the dislocations. This transcendental equation may be roughly approximated by
b hc 9 .9 f
Considering that misfit dislocations are usually unwanted but that they must
appear with increasing layer thickness - however not out of thin air we ask an important question:
Exactly how are misfit dislocations produced and incorporated into the Suffice it to say that while this question has not been fully answered,
interface if the critical thickness is reached. More to the point: How can I prevent this nucleation and migration process?
there are many ways and tricks to keep misfit dislocations from appearing at the earliest possible moment.