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 Encyclopedia of

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Microplasma—Wool
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 Encyclopedia of

Plasma
Technology
Volume II
Microplasma—Wool

J. Leon Shohet, Editor

CRC Press
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Brief Contents

Volume I DC Plasma: Powder Metallurgy . . . . . . . . . . . . 317

Dental Implants: Plasma Polymerization for . . . 328
Acrylates and Methacrylates: Radical Die Singulation . . . . . . . . . . . . . . . . . . . . . . . . . 339
Polymerization . . . . . . . . . . . . . . . . . . . . . . . 1 Dielectric Barrier Discharge (DBD) . . . . . . . . . . 355
Amine Monomers: Plasma and Ultraviolet Dielectric Barrier Discharge: Biomaterials . . . . . 367
Polymerization . . . . . . . . . . . . . . . . . . . . . . . 14 Dielectric Barrier Discharge: Combustion . . . . . 381
Antimicrobial Biomedical Materials: Dielectric Barrier Discharge: Compact
Engineering . . . . . . . . . . . . . . . . . . . . . . . . . 26 Repetitive Unipolar Nanosecond-Pulse
Arc Welding . . . . . . . . . . . . . . . . . . . . . . . . . . . 36 Generators . . . . . . . . . . . . . . . . . . . . . . . . . . 388
Arc-Heated Wind Tunnels . . . . . . . . . . . . . . . . . 54 Dielectric Barrier Discharge: Meat Treatment . . 395
Atmospheric Pressure Plasmas: Apple Treatment 66 Dispenser Hollow Cathode Discharges . . . . . . . . 405
Atmospheric Pressure Plasmas: Dusty Plasma Liquid: Non-Newtonian
Free-Radical Movements in. . . . . . . . . . . . . . 73 Behavior. . . . . . . . . . . . . . . . . . . . . . . . . . . . 412
Atmospheric Pressure Plasmas: Electrical Discharge Machining (EDM):
Low-Temperature Processes . . . . . . . . . . . . . 82 Casting Process Parameters . . . . . . . . . . . . . 417
Atmospheric Pressure Plasmas: Electrical Discharge Machining (EDM):
Polymerization . . . . . . . . . . . . . . . . . . . . . . . 92 Nanoparticle Generation . . . . . . . . . . . . . . . . 432
Atmospheric Pressure Plasmas: Uniform Electrothermal Vaporization Inductively
Glow Discharge . . . . . . . . . . . . . . . . . . . . . . 107 Coupled Plasma Mass Spectrometry
Atomic Layer Etching . . . . . . . . . . . . . . . . . . . . 128 (ETV-ICP-MS) . . . . . . . . . . . . . . . . . . . . . . . 443
Atomic Layer Etching: Directional . . . . . . . . . . 133 Embryonic Stem Cells: Plasma-Directed
Atomic Layer Re-Deposition for Nanoscale Differentiation . . . . . . . . . . . . . . . . . . . . . . . 452
Devices . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 143 Engine Emission Control: Ozone and
Beam Plasmas: Materials Production . . . . . . . . 152 Plasma Desorption . . . . . . . . . . . . . . . . . . . . 467
Biology: Low-Temperature Plasmas in. . . . . . . . 167 Etching: Endpoint Detection . . . . . . . . . . . . . . . 476
Biotechnology: Plasmas in . . . . . . . . . . . . . . . . . 179 Food Packaging . . . . . . . . . . . . . . . . . . . . . . . . 491
Blood Coagulation: Plasma Torch . . . . . . . . . . . 186 Gas-Discharge Plasma: Biofilm Inactivation . . . 498
Boron Trichloride Dry Etching . . . . . . . . . . . . . 193 Glass Fibers: Improved Interfacial Adhesion . . . 502
Cancer Therapy: Cold Atmospheric Gliding Arc Discharge: Combustion
Pressure Plasma . . . . . . . . . . . . . . . . . . . . . . 203 Enhancement . . . . . . . . . . . . . . . . . . . . . . . . 517
Capacitively Coupled Plasmas: Glow Discharges: Stratification . . . . . . . . . . . . . 529
Electromagnetic Effects. . . . . . . . . . . . . . . . . 212 Graphene: Plasma Etching . . . . . . . . . . . . . . . . 540
Carbon-Shunting Arc Plasmas . . . . . . . . . . . . . 228 Helicon Source for Electric Propulsion . . . . . . . 549
CARS Diagnostics: High-Pressure High E/N Discharges: Applications . . . . . . . . . . 555
Nonequilibrium Plasmas . . . . . . . . . . . . . . . . 237 High-Power Impulse Magnetron Sputtering
Cell Culture: Polymerization of PMMA for . . . . 248 (HiPIMS) . . . . . . . . . . . . . . . . . . . . . . . . . . . 588
Cellulose-Based Materials: Plasma Modification 259 High-Pressure Optical Diagnostics . . . . . . . . . . . 603
Coal Combustion: Plasma-Assisted . . . . . . . . . . 269 Inductively Coupled Plasma Mass
Cold Atmospheric Pressure Plasma: Spectrometry . . . . . . . . . . . . . . . . . . . . . . . . 623
Technology . . . . . . . . . . . . . . . . . . . . . . . . . . 284 Inductively Coupled Plasma Optical
Combinatorial Plasma Polymerization: Emission Spectrometry . . . . . . . . . . . . . . . . . 655
Carbon-Based Films . . . . . . . . . . . . . . . . . . . 294 Inductively Coupled Plasma Sputtering:
DC Arc Plasma Torch with Structure of IV-VI Semiconductors . . . . . . . . 679
Nanocarbon-Coated Electrodes . . . . . . . . . . . 307 Kelvin Probe. . . . . . . . . . . . . . . . . . . . . . . . . . . 692

v
vi Brief Contents

Laser-Induced Plasma. . . . . . . . . . . . . . . . .... 696 Powders: Plasma Spray PVD for

Liquids and Gas-Liquid Environments: High-Throughput Production . . . . . . . . . . . . 1176
Plasmas in . . . . . . . . . . . . . . . . . . . . . . . . . . 702 Pulsed Inductive Plasma Acceleration:
Mercury Probe . . . . . . . . . . . . . . . . . . . . . . . . . 716 Optimization. . . . . . . . . . . . . . . . . . . . . . . . . 1191
Metal Deposition: Plasma-Based Processes. . . . . 722 Pulsed Plasmas: Nanoparticles and Thin
Microdischarges . . . . . . . . . . . . . . . . . . . . . . . . 741 Film Synthesis . . . . . . . . . . . . . . . . . . . . . . . 1201
Microorganisms: Destruction with Quantum Plasmas . . . . . . . . . . . . . . . . . . . . . . . 1216
Nonthermal Plasma . . . . . . . . . . . . . . . .... 758 Radar Cross-Section Reduction: Stealth
Technology . . . . . . . . . . . . . . . . . . . . . . . . . . 1224
Re-Entry Vehicles: Communication through
Volume II Plasma . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1236
Root Canal Treatment. . . . . . . . . . . . . . . . . . . . 1249
Microplasma Atomic Emission Spectroscopy . . . 773 Scanning Electron Microscopy . . . . . . . . . . . . . 1255
Microplasmas . . . . . . . . . . . . . . . . . . . . . . . . . . 780 Seed Treatment: Cold Plasma . . . . . . . . . . . . . . 1269
Microplasmas: Environmental and Semiconductor (III-V) Thin Films: Plasma
Biological Applications . . . . . . . . . . . . . . . . . 791 Etching. . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1271
Microwave Plasmas: Single Crystal Semiconductor-Bridge Plasma . . . . . . . . . . . . . . 1280
Diamond Synthesis . . . . . . . . . . . . . . . . . . . . 806 Semiconductors: Etching with Sulfur
Microwave-Generated Fireballs . . . . . . . . . . . . . 819 Hexafluoride (SF6) . . . . . . . . . . . . . . . . . . . . 1288
Modeling: 2-D. . . . . . . . . . . . . . . . . . . . . . . . . . 833 Sewage Sludge: Plasma Gasification of . . . . . . . 1295
Modeling: Electromagnetic Plasma . . . . . . . . . . 847 Shadow Mask Plasma Display Panel . . . . . . . . . 1305
Nanocrystalline Diamond Coatings . . . . . . . . . . 857 Solid Oxide Fuel Cells (SOFC): Advanced
Nanotechnology: Plasma-Based . . . . . . . . . . . . . 874 Production Techniques . . . . . . . . . . . . . . . . . 1314
Negative Ion and Dust Particle-Containing Space Plasma Thrusters: Magnetic Nozzles for . . . 1329
Plasmas . . . . . . . . . . . . . . . . . . . . . . . . . . . . 887 Spacecraft Charging . . . . . . . . . . . . . . . . . . . . . 1352
Negative Ion Plasmas . . . . . . . . . . . . . . . . . . . . 906 Steam Reforming . . . . . . . . . . . . . . . . . . . . . . . 1367
NOx: Removal by Plasma Catalytic Process . . . 944 Strip Hollow Cathode Plasmas: PECVD and
Opals (2-D Colloidal Crystals): Plasma Thermochemical Treatment. . . . . . . . . . . . . . 1376
Etching of. . . . . . . . . . . . . . . . . . . . . . . . . . . . 953 Taguchi Method: Plasma Cutting Parameters . . 1389
Ozone Injection: Plasma-Induced . . . . . . . . . . . 964 Textiles . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1396
Paper: Plasma Deacidification . . . . . . . . . . . . . . 974 Textiles: Nanostructured Plasma Coatings . . . . . 1408
PECVD: Silicon Nitride. . . . . . . . . . . . . . . . . . . 982 Textiles: PET, Poly-DADMAC-Containing
Photonic Crystals: Tunable Plasma . . . . . . . . . . 993 Fabrics . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1417
Plasma Bullets . . . . . . . . . . . . . . . . . . . . . . . . . 997 Thermal Plasmas: Boundary Conditions on
Plasma Electron Sources . . . . . . . . . . . . . . . . . . 1006 Heat Flux . . . . . . . . . . . . . . . . . . . . . . . . . . . 1424
Plasma Flow Control. . . . . . . . . . . . . . . . . . . . . 1016 Thin Films: Polyaniline and Poly
(3-methylthiophene) . . . . . . . . . . . . . . . . . . . 1442
Plasma Impedance in Discharges. . . . . . . . . . . . 1038
Thrusters: Ablative Pulsed, Plasma
Plasmonics and Surface Plasmons . . . . . . . . . . . 1062
Acceleration in . . . . . . . . . . . . . . . . . . . . . . . 1452
PLGA: Immobilization of Fibroblast
Thrusters: Current-Free Plasma . . . . . . . . . . . . 1462
Growth Factor . . . . . . . . . . . . . . . . . . . . . . . 1083
Thrusters: Iodine Plasma . . . . . . . . . . . . . . . . . 1474
Pollutants: Aqueous Organic, Nonthermal
Degradation . . . . . . . . . . . . . . . . . . . . . . . . . 1087 Thrusters: Pulsed Plasmas . . . . . . . . . . . . . . . . 1484
Polymer Surface Modification: Plasma for Vacuum Arc Cathode Spots. . . . . . . . . . . . . . . . 1492
Applications . . . . . . . . . . . . . . . . . . . . . . . . . 1097 Vacuum Ultraviolet (VUV) Sources . . . . . . . . . . 1499
Polymer–Cold Plasma Interactions . . . . . . . . . . 1108 Volatile Organic Compounds Decomposition . . . 1504
Polymeric Microfluidics: Fabricated and Wafer Movement and Micro-Arc
Modified Using Plasmas . . . . . . . . . . . . . . . . 1112 Discharges: Detection . . . . . . . . . . . . . . . . . . 1517
Polymers: Plasma Micro-Nanotexturing and Wide Bandgap Materials: Plasma Etching . . . . . 1530
Plasma-Directed Organization . . . . . . . . . . . . 1125 Wood Surfaces: Plasma Activation . . . . . . . . . . 1541
Polyolefin Surfaces: Functional Groups . . . . . . . 1138 Wool: Low-Temperature Plasma Treatment of. . . 1552
 Encyclopedia of Plasma Technology
Editor-in-Chief

J. Leon Shohet
Department of Electrical and Computer Engineering,
University of Wisconsin-Madison, Madison, Wisconsin, U.S.A.

Editorial Advisory Board

Andy Antonelli Nicholas C.M. Fuller
Nanometrics, Portland, Research Staff Member and Manager,
Oregon, U.S.A. Plasma Processing & Wet Clean Technology,
IBM T.J. Watson Research Center,
Yorktown Heights, New York, U.S.A.
Samer Banna
Plasma Engineering Group Lead,
Etch Core Engineering, Applied Materials Inc., Ronald M. Gilgenbach
Sunnyvale, California, U.S.A. University of Michigan, Ann Arbor,
Michigan, U.S.A.

Rod Boswell
Australian National University, Steven L. Girshick
Canberra, Australian Capital Territory, Professor of Mechanical Engineering,
Australia Graduate Faculty, Chemical Engineering,
Materials Science, Nanoparticle Science
and Engineering, and Director,
Raymond (Reuven) Boxman High Temperature and Plasma Laboratory,
Director, Electrical Discharge and University of Minnesota,
Plasma Laboratory, Kranzberg Chair of Plasma Minneapolis, Minnesota, U.S.A.
Engineering, Tel Aviv University, Tel Aviv, Israel

Steven J. Gitomer
Jane P. Chang Los Alamos National Lab, Los Alamos,
Electronic Materials Synthesis and New Mexico, U.S.A.
Plasma Processing Lab,
University of California—Los Angeles,
Los Angeles, California, U.S.A. Valery Godyak
RF Plasma Consulting, Brookline,
Massachusetts, U.S.A.
Pietro Favia
Department of Chemistry,
University of Bari and Plasma Solution, Richard Gottscho
Bari, Italy Lam Research, Fremont, California, U.S.A.

vii
viii Editor-in-Chief

David Graves Karen L. Seaward

University of California—Berkeley, Microdevice Technologies Section Manager,
Berkeley, California, U.S.A. Agilent Labs,
Molecular Separations Lab,
Santa Clara,
Magne Kristiansen California, U.S.A.
Texas Tech University,
Lubbock, Texas, U.S.A.
Denis Shamiryan
Yoshio Nishi Member of Technical Staff,
Stanford University, GlobalFoundries,
Stanford, California, U.S.A. Dresden, Germany

Gottlieb S. Oehrlein Harsh Sinha

Materials Science and Engineering Department,
KLA-Tencor, Milpitas,
Institute for Research in Electronics and Applied
California, U.S.A.
Physics, University of Maryland,
College Park, Maryland, U.S.A.
Masayuki Tomoyasu
Vivian Ryan Tokyo Electron Limited,
GlobalFoundries Inc., Albany, Austin,
New York, U.S.A. Texas, U.S.A.
Contributors

Eduardo Ahedo / Space Propulsion and Plasma Team (EP2), Carlos III University of
Madrid, Leganes, Spain
Mari Aida / Tokyo Institute of Technology, Yokohama, Japan
Eser Metin Akinoglu / Department of Physics, Freie Universität Berlin (Free University of
Berlin), Berlin, and Max-Planck-Institut für Kolloid- und Grenzflächenforschung (Max
Planck Institute of Colloids and Interfaces), Potsdam, Germany
E. Amanatides / Department of Chemical Engineering, University of Patras, Patras,
Greece
Hiroshi Amemiya / Riken-obkai, Wakoshi, Japan
I.I. Amirov / Yaroslavl Branch of the Institute of Physics and Technology of Russian
Academy of Sciences, Yaroslavl, Russia
André Anders / Lawrence Berkeley National Laboratory, Berkeley, California, U.S.A.
Nikolay Andrianov / Svetlana-Rost JSC, Saint-Petersburg, Russia
V. Antonini / Institute of Biophysics, National Research Council, Trento, Italy
Johannes Arnold / Institute of Engineering Thermodynamics, German Aerospace
Center (DLR), Stuttgart, Germany
Gaelle Aziz / Department of Applied Physics, Ghent University, Ghent, Belgium
G. Bao / Department of Biomedical Engineering, Georgia Institute of Technology
and Emory University, Atlanta, Georgia, U.S.A.
Junwei Bao / Timbre Technologies, Inc., Fremont, California, U.S.A.
Yuri Barsukov / Samsung Electronics Co. Ltd, Suwon, Korea
Llorenç Bautista / Advanced Materials Group, Research and Development Department,
Leitat Technological Center, Terrassa, Spain
Diane Beauchemin / Department of Chemistry, Queen’s University, Kingston, Ontario,
Canada
Kurt H. Becker / Department of Applied Physics and Department of Mechanical and
Aerospace Engineering, Tandon School of Engineering, New York University, Brooklyn,
New York, U.S.A.
Jianzhong Bei / Beijing National Laboratory for Molecular Sciences (BNLMS), State Key
Laboratory of Polymer Physics and Chemistry, Institute of Chemistry, Chinese Academy of
Sciences, Beijing, China
Jan Benedikt / Faculty of Physics and Astronomy, Ruhr-University Bochum, Bochum,
Germany
Arijit Bera / Institute of Photonics, University of Eastern Finland, Joensuu, Finland
A. Berardinelli / Department of Agricultural and Food Sciences, University of Bologna,
Cesena, Italy
Anadi Bhatia / KLA-Tencor Corporation, Milpitas, California, U.S.A.
Daniel L. G. Borges / Chemistry Department, Federal University of Santa Catarina,
Florianópolis, Brazil
Edward Bormashenko / Physics Department, Ariel University, Ariel, Israel
Iain D. Boyd / Department of Aerospace Engineering, University of Michigan, Ann Arbor,
Michigan, U.S.A.

ix
x Contributors

Ronny Brandenburg / Leibniz Institute for Plasma Science and Technology (INP
Greifswald), Greifswald, Germany
Victor Breedveld / Georgia Institute of Technology, Atlanta, Georgia, U.S.A.
Graciela Brelles-Mariño / Center for Research and Development on Industrial
Fermentations (CINDEFI), National University of La Plata, La Plata, Argentina
Peter J. Bruggeman / Department of Mechanical Engineering, University of Minnesota,
Minneapolis, Minnesota, U.S.A.
Silvio Francisco Brunatto / Department of Mechanical Engineering, Federal University of
Paraná (UFPR), Curitiba, Brazil
C. Bueno-Ferrer / BioPlasma Research Group, School of Food Science and Environmental
Health, Dublin Institute of Technology, Dublin, Ireland
Victor Burdovitsin / Department of Physics, Tomsk State University of Control Systems
and Radioelectronics, Tomsk, Russia
Judit Buxadera-Palomero / Department of Materials Science and Metallurgical
Engineering, Technical University of Catalonia (BarcelonaTECH), Barcelona, Spain
Kerri Cahoy / Space Telecommunications, Astronomy, and Radiation Laboratory,
Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts, U.S.A.
Cecelia Campochiaro / KLA-Tencor Corporation, Milpitas, California, U.S.A.
Cristina Canal / Department of Materials Science and Metallurgical Engineering,
Technical University of Catalonia (BarcelonaTECH), Barcelona, Spain
Angela M. Capece / Department of Physics, The College of New Jersey, Ewing,
New Jersey, U.S.A.
Rodrigo Perito Cardoso / Department of Mechanical Engineering, Federal University of
Paraná (UFPR), Curitiba, Brazil
Olivier Carton / Laboratory of Condensed Matter Physics, University of Picardie Jules
Verne, Amiens, France
Vladimir Cech / Institute of Materials Chemistry, Brno University of Technology, Brno,
Czech Republic
Ke Vin Chan / Research Unit Plasma Technology (RUPT), Department of Applied Physics,
Faculty of Engineering and Architecture, Ghent University, Ghent, Belgium
Bhaskar Chaudhury / Dhirubhai Ambani Institute of Information and Communication
Technology (DA-IICT), Gandhinagar, Gujarat, India and Plasma and Energy Conversion
Laboratory (LAPLACE), University of Toulouse, Toulouse, France
Francis F. Chen / Electrical Engineering Department, University of California,
Los Angeles, Los Angeles, California, U.S.A.
Koichi Chiba / Kwansei Gakuin University, Sanda, Japan
Wonho Choe / Department of Physics, Korea Advanced Institute of Science and
Technology, Daejeon, Korea
Paul K. Chu / Department of Physics and Materials Science, City University of Hong Kong,
Hong Kong, China
Pieter Cools / Research Unit Plasma Technology (RUPT), Department of Applied Physics,
Ghent University, Ghent, Belgium
P.J. Cullen / BioPlasma Research Group, School of Food Science and Environmental Health,
Dublin Institute of Technology, Dublin, Ireland and School of Chemical Engineering,
University of New South Wales Australia, Sydney, New South Wales, Australia
M. Dalla Serra / Institute of Biophysics, National Research Council, Trento, Italy
Nathalie De Geyter / Research Unit Plasma Technology (RUPT), Department of Applied
Physics, Faculty of Engineering and Architecture, Ghent University, Ghent, Belgium
Contributors xi

Alessandro De Giacomo / Department of Chemistry, University of Bari, Bari, Italy

Marcella Dell’Aglio / Institute of Nanotechnology, National Council of Research, Bari, Italy
Gerardo Diaz / School of Engineering, University of California Merced, Merced,
California, U.S.A.
Lifang Dong / College of Physics Science and Technology, Hebei University, Baoding,
China
Yuan-Hua Dong / Key Laboratory of Soil Environment and Pollution Remediation,
Institute of Soil Science, Chinese Academy of Sciences, Nanjing, China
Jason M. Doub / ON Semiconductor, Phoenix, Arizona, U.S.A.
Yixiang Duan / Research Center of Analytical Instrumentation, Sichuan University,
Chengdu, China
Huseyin Ekinci / Electrical and Computer Engineering, Texas Tech University, Lubbock,
Texas, U.S.A.
Sebastian U. Engelmann / T.J. Watson Research Center, IBM, Yorktown Heights, New
York, U.S.A.
Denis Eremin / Institute for Theoretical Electrical Engineering, Center for Plasma Science
and Technology, Ruhr University Bochum, Bochum, Germany
Weili Fan / College of Physics Science and Technology, Hebei University, Baoding, China
Hongyan Feng / University of Science and Technology of China, Hefei, China
V.E. Fortov / Moscow Institute of Physics and Technology, Dolgoprudny and Joint
Institute for High Temperatures of the Russian Academy of Sciences (JHIT RAS),
Moscow, Russia
Thierry Fouquet / Materials Research and Technology, Luxembourg Institute of Science
and technology, Hautcharage, Luxembourg
Jörg Friedrich / Department of Polymer Processing and Physics, Technical University of
Berlin, Berlin, Germany
Jose Garcia-Torres / Department of Chemistry, University of Surrey, Guildford, U.K. and
Advanced Materials Group, Research and Development Department, Leitat Technological
Center, Terrassa, Spain
Michael Giersig / Department of Physics, Freie Universität Berlin (Free University of
Berlin), and Institute of Nano-Architectures for Energy Conversion, Helmholtz Zentrum
Berlin, Berlin, Germany
F. Javier Gil / Department of Materials Science and Metallurgical Engineering, Technical
University of Catalonia (BarcelonaTECH), Barcelona, Spain
Evangelos Gogolides / Institute of Nanoscience and Nanotechnology, National Center for
Scientific Research (NCSR) “Demokritos”, Attiki, Greece
E.S. Gorlachev / Yaroslavl Branch of the Institute of Physics and Technology of Russian
Academy of Sciences, Yaroslavl, Russia
Richard A. Gottscho / Lam Research, Fremont, California, U.S.A.
Gordon M. Grivna / ON Semiconductor, Phoenix, Arizona, U.S.A.
Fernando Haas / Institute of Physics, Federal University of Rio Grande do Sul,
Porto Alegre, Brazil
Erik Hanley / University of Wisconsin-Madison, Madison, Wisconsin, U.S.A.
Serajul Haque / Faculty of Mechanical and Industrial Engineering, Bahir Dar Institute
of Technology (BIT), Bahir Dar University, Bahir Dar, Ethiopia
Markus Häyrinen / Institute of Photonics, University of Eastern Finland, Joensuu, Finland
Dirk Hegemann / Empa, Swiss Federal Laboratories for Materials Science and
Technology, St. Gallen, Switzerland
xii Contributors

Kadek W. Hemawan / Geophysical Laboratory, Carnegie Institution of Washington,

District of Columbia, Washington, U.S.A.
Russell J. Hemley / Geophysical Laboratory, Carnegie Institution of Washington,
District of Columbia, Washington, U.S.A.
Rudolf Henne / Institute of Engineering Thermodynamics, German Aerospace Center
(DLR), Stuttgart, Germany
Dennis Hess / Georgia Institute of Technology, Atlanta, Georgia, U.S.A.
Pieter Heyse / Textile Coating, Finishing and Surface Modification, Centexbel,
Zwijnaarde, Belgium
Gundula Hidde / Federal Institute for Materials Research and Testing (BAM) Berlin,
Berlin, Germany
Tasuku Hideshima / University of Tokyo, Tokyo, Japan
Somashekhar S. Hiremath / Department of Mechanical Engineering, Indian Institute of
Technology Madras, Chennai, India
Marcin Holub / Faculty of Electrical Engineering, West Pomeranian University of
Technology in Szczecin, Szczecin, Poland
Seppo Honkanen / Institute of Photonics, University of Eastern Finland, Joensuu, Finland
Alan R. Hoskinson / Department of Electrical and Computer Engineering, Tufts
University, Medford, Massachusetts, U.S.A.
J.H. Hsieh / Department of Materials Engineering, Ming Chi University of Technology,
Taipei, Taiwan
Xixue Hu / Beijing National Laboratory for Molecular Sciences (BNLMS), State Key
Laboratory of Polymer Physics and Chemistry, Institute of Chemistry, Chinese Academy of
Sciences, Beijing, China
Lily Huang / Department of Chemistry, Queen’s University, Kingston, Ontario, Canada
Eric Hudson / Lam Research, Fremont, California, U.S.A.
A.S. Ivanov / Joint Institute for High Temperatures of the Russian Academy of Sciences
(JHIT RAS), Moscow, Russia
Takahiro Iwai / Kwansei Gakuin University, Sanda, Japan
Neelesh K. Jain / Department of Mechanical Engineering, Indian Institute of Technology
Indore, Indore, India
Dinesh D. Jayasena / Department of Animal Science, Uva Wellassa University, Badulla, Sri
Lanka
Eli Jerby / Department of Physical Electronics, Faculty of Engineering, Tel Aviv University,
Ramat Aviv, Israel
Suyog Jhavar / Department of Mechanical Engineering, Indian Institute of Technology
Indore, Indore, India
C.B. Jia / Institute of Materials Joining, Shandong University, Jinan, China
Cheorun Jo / Department of Agricultural Biotechnology, Center for Food and
Bioconvergence, and Research Institute of Agriculture and Life Science, Seoul National
University, Seoul, Korea
Shashikant Joshi / Mechanical Engineering Department, Nirma University, Gujarat, India
Yiguang Ju / Department of Mechanical and Aerospace Engineering, Princeton University,
Princeton, New Jersey, U.S.A.
Mashiro Kaga / University of Tokyo, Tokyo, Japan
Ken Kakegawa / Tokyo Institute of Technology, Yokohama, Japan
Hiroaki Kakiuchi / Department of Precision Science and Technology, Graduate School of
Engineering, Osaka University, Osaka, Japan
Contributors xiii

Makoto Kambara / University of Tokyo, Tokyo, Japan

Chi-wai Kan / Institute of Textiles and Clothing, Hong Kong Polytechnic University,
Hung Hom, Hong Kong
Keren J. Kanarik / Lam Research, Fremont, California, U.S.A.
Yuji Kasashima / Advanced Manufacturing Research Institute, National Institute of
Advanced Industrial Science and Technology (AIST), Tosu, Japan
Mikhail A. Kats / Department of Electrical and Computer Engineering, and Materials
Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin,
U.S.A.
Farhad Kaveh / Department of Chemistry, Queen’s University, Kingston, Ontario, Canada
Michael Keidar / Department of Mechanical and Aerospace Engineering, George
Washington University, Washington, District of Columbia, U.S.A.
Sameen Ahmed Khan / Department of Mathematics and Sciences, College of Arts and
Applied Sciences, Dhofar University, Salalah, Oman
Hyun-Ha Kim / Institute for Environmental Management Technology, National Institute
of Advanced Industrial Science and Technology (AIST), Tsukuba, Japan
Hyun-Joo Kim / Post-Harvest Technology Division, National Institute of Crop Science,
Rural Development Administration, Suwon, Korea
Minkwan Kim / School of Mechanical Engineering, University of Adelaide, Adelaide,
South Australia, Australia
Maria Kitsara / Institute of Microelectronics of Barcelona, IMB-CNM (CSIC), Autonomous
University of Barcelona, Barcelona, Spain
Claus-Peter Klages / Institute for Surface Technology, TU Braunschweig, Braunschweig,
Germany
Aloisio Nelmo Klein / Department of Mechanical Engineering, Federal University of Santa
Catarina (UFSC), Florianopolis, Brazil
Anton Kobelev / Department of Plasma Physics, Peter The Great Saint-Petersburg
Polytechnic University, Saint-Petersburg, Russia
Vladimir I. Kolobov / CFD Research Corporation, Huntsville, Alabama, U.S.A.
Dimitrios Kontziampasis / Institute of Nanoscience and Nanotechnology, National Center
for Scientific Research (NCSR)-Demokritos, Attiki, Greece
Prashanth Kothnur / Applied Materials, Inc., Santa Clara, California, U.S.A.
Markku Kuittinen / Institute of Photonics, University of Eastern Finland, Joensuu,
Finland
P. Manoj Kumar Reddy / Energy and Environmental Research Laboratory, Department of
Chemistry, Indian Institute of Technology (IIT) Hyderabad, Hyderabad, India
Spencer P. Kuo / Department of Electrical and Computer Engineering, Tandon School
of Engineering, New York University, Brooklyn, New York, U.S.A.
Takuya Kuwahara / Department of Products Engineering and Environmental
Management, Nippon Institute of Technology, Saitama, Japan
Shu T. Lai / Space Propulsion Laboratory, Massachusetts Institute of Technology (MIT),
Cambridge and Boston College, Newton, Massachusetts, U.S.A.
G.B.V.S. Lakshmi / Materials Science Division, Inter University Accelerator Centre, New
Delhi, India
Mounir Laroussi / Laser and Plasma Engineering Institute, Old Dominion University,
Norfolk, Virginia, U.S.A.
Jason Lauer / Thin Films, Intel, Portland, Oregon, U.S.A.
J. Lauer / University of Wisconsin-Madison, Madison, Wisconsin, U.S.A.
xiv Contributors

Walter R. Lempert / Departments of Mechanical and Aerospace Engineering and

Chemistry and Biochemistry, Ohio State University, Columbus, Ohio, U.S.A.
Christophe Leys / Department of Applied Physics, Ghent University, Ghent, Belgium
Chuan Li / Department of Biomedical Engineering, National Yang Ming University, Taipei,
Taiwan
Jian-Gang Li / Key Laboratory of Soil Environment and Pollution Remediation, Institute of
Soil Science, Chinese Academy of Sciences, Nanjing, China
Ling Li / Key Laboratory of Soil Environment and Pollution Remediation, Institute of Soil
Science, Chinese Academy of Sciences, Nanjing, China
Qing Li / School of Electronic Science and Engineering, Southeast University,
Nanjing, China
Xuechen Li / College of Physics Science and Technology, Hebei University, Baoding, China
Yinghong Li / Science and Technology on Plasma Dynamics Lab, Air Force Engineering
University (AFEU), Xi'an, China
Thorsten Lill / Lam Research, Fremont, California, U.S.A.
David G. Lishan / Plasma-Therm, LLC, St. Petersburg, Florida, U.S.A.
Jose L. Lopez / Department of Physics, Seton Hall University, South Orange, New Jersey,
U.S.A.
XinPei Lu / State Key Laboratory of Advanced Electromagnetic Engineering and
Technology, Huazhong University of Science and Technology, Wuhan, China
Gary Lyons / Department of Cell and Developmental Biology, School of Medicine and
Public Health, University of Wisconsin-Madison, Madison, Wisconsin, U.S.A.
Peng Ma / Nanjing University of Science and Technology, Nanjing, China
Paul MacDonald / KLA-Tencor Corporation, Milpitas, California, U.S.A.
Kenneth D. Mackenzie / Plasma-Therm, LLC, St. Petersburg, Florida, U.S.A.
M. Magureanu / Department of Plasma Physics and Nuclear Fusion, National Institute for
Lasers, Plasma and Radiation Physics, Magurele-Bucuresti, Romania
Yoseif Makonnen / Department of Chemistry, Queen’s University, Kingston, Ontario,
Canada
Jeffrey Marks / Lam Research, Fremont, California, U.S.A.
Fanying Meng / Sichuan University, Chengdu, China
Mario Merino / Space Propulsion and Plasma Team (EP2), Carlos III University of
Madrid, Leganes, Spain
Robert L. Merlino / Department of Physics and Astronomy, University of Iowa, Iowa City,
Iowa, U.S.A.
Grégory Mertz / Materials Research and Technology, Luxembourg Institute of Science
and technology, Hautcharage, Luxembourg
V.E. Messerle / Combustion Problems Institute, Almaty, Kazakhstan and Institute
of Thermophysics SB RAS, Novosibirsk, Russia
Bruce Micales / University of Wisconsin-Madison, Madison, Wisconsin, U.S.A.
Andrew Michelmore / Mawson Institute, University of South Australia, Mawson Lakes,
South Australia, Australia
L. Minati / Bruno Kessler Foundation, Trento, Italy
Hidekazu Miyahara / Tokyo Institute of Technology, Yokohama, Japan
Hiroshi Mizuta / School of Materials Science, Japan Advanced Institute of Science
and Technology, Nomi, Japan and Nanoelectronics and Nanotechnologies Research
Group, Faculty of Physical Sciences and Engineering, University of Southampton,
Southampton, U.K.
Contributors xv

Aaron Montello / Departments of Mechanical and Aerospace Engineering and Chemistry

and Biochemistry, Ohio State University, Columbus, Ohio, U.S.A.
Se Youn Moon / Department of Quantum System Engineering, Chonbuk National
University, Jeonju, Korea
Olivier Moreau / KLA-Tencor Corporation, Milpitas, California, U.S.A.
Rino Morent / Research Unit Plasma Technology (RUPT), Department of Applied Physics,
Faculty of Engineering and Architecture, Ghent University, Ghent, Belgium
Antonios John Mountouris / National Technical University of Athens, Athens, Greece
Yoichi Nagata / Agilent Technologies Inc., Tokyo, Japan
Nobuaki Negishi / Institute for Environmental Management Technology, National Institute
of Advanced Industrial Science and Technology (AIST), Tsukuba, Japan
Deborah Neumayer / IBM Watson Research Center, Yorktown Heights, New York, U.S.A.
M. Nichols / University of Wisconsin-Madison, Madison, Wisconsin, U.S.A.
Sagar H. Nikam / Department of Mechanical Engineering, Indian Institute of Technology
Indore, Indore, India
Anton Nikiforov / Department of Applied Physics, Ghent University, Ghent, Belgium
Krasimir Nikolov / Institute for Surface Technology, TU Braunschweig, Braunschweig,
Germany
Atsushi Ogata / Institute for Environmental Management Technology, National Institute
of Advanced Industrial Science and Technology (AIST), Tsukuba, Japan
Hiromasa Ohmi / Department of Precision Science and Technology, Graduate School of
Engineering, Osaka University, Osaka, Japan
Akitoshi Okino / Tokyo Institute of Technology, Yokohama, Japan
Efim Oks / Department of Physics, Tomsk State University of Control Systems
and Radioelectronics, Tomsk, Russia
Masaaki Okubo / Department of Mechanical Engineering, Osaka Prefecture University,
Sakai, Japan
Timothy Ombrello / Aerospace Systems Directorate, U.S. Air Force Research Laboratory,
Wright-Patterson AFB, Ohio, U.S.A.
Kostya (Ken) Ostrikov / School of Chemistry, Physics, and Materials Engineering,
Queensland University of Technology, Brisbane, Queensland and Commonwealth Scientific
and Industrial Research Organisation (CSIRO), Lindfield, New South Wales, Australia
Yang Pan / Lam Research, Fremont, California, U.S.A.
Yuyang Pan / College of Quality and Technical Supervision, Hebei University, Baoding,
China
Nicolai S. Panikov / Department of Immunology and Infectious Diseases, Harvard T.H.
Chan School of Public Health, Boston, Massachusetts, U.S.A.
S.K. Pankaj / BioPlasma Research Group, School of Food Science and Environmental
Health, Dublin Institute of Technology, Dublin, Ireland
V.I. Parvulescu / Faculty of Chemistry, Department of Organic Chemistry, Biochemistry
and Catalysis, University of Bucharest, Bucharest, Romania
Ashil Patel / Marine Engineering Department, Ganpat University, Gujarat, India
Henrique Cezar Pavanati / Department of Metal Mechanics, Federal Institute of Santa
Catarina (IFSC), Florianopolis, Brazil
S.J. Pearton / Department of Materials Science and Engineering, University of Florida,
Gainesville, Florida, U.S.A.
C. Pederzolli / Bruno Kessler Foundation, Trento, Italy
L. Pekker / Victor Technologies, West Lebanon, New Hampshire, U.S.A.
xvi Contributors

O.F. Petrov / Moscow Institute of Physics and Technology, Dolgoprudny, and Joint Institute
for High Temperatures of the Russian Academy of Sciences (JHIT RAS), Moscow, Russia
and Center for Astrophysics, Space Physics, and Engineering Research (CASPER), Baylor
University, Waco, Texas, U.S.A.
Iris Pilch / Linköping University, Linköping, Sweden
Kurt A. Polzin / George C. Marshall Space Flight Center, National Aeronautics and Space
Administration (NASA), Huntsville, Alabama, U.S.A.
Maja Radetic / Faculty of Technology and Metallurgy, University of Belgrade, Belgrade,
Serbia
L. Ragni / Department of Agricultural and Food Sciences, University of Bologna, Cesena,
Italy
Jozef Ráhel / Department of Physical Electronics, Masaryk University, Brno, Czech
Republic
Shahid Rauf / Applied Materials, Inc., Sunnyvale, California, U.S.A.
F. Ren / Department of Chemical Engineering, University of Florida, Gainesville, Florida,
U.S.A.
He Ren / Applied Materials, Inc., Sunnyvale, California, U.S.A.
P. Rocculi / Department of Agricultural and Food Sciences, University of Bologna, Cesena,
Italy
Daniel Rodriguez / Department of Materials Science and Metallurgical Engineering,
Technical University of Catalonia (BarcelonaTECH), Barcelona, Spain
Matthieu Roussey / Institute of Photonics, University of Eastern Finland, Joensuu,
Finland
Robert Ruckdäschel / Institute of Engineering Thermodynamics, German Aerospace
Center (DLR), Stuttgart, Germany
Nausheen Sadiq / Department of Chemistry, Queen’s University, Kingston, Ontario, Canada
R.K. Sahu / Department of Mechanical Engineering, Indian Institute of Technology
Madras, Chennai, India
Tarek Salem / National Research Center (NRC), Cairo, Egypt and Leibniz Institute of
Polymer Research Dresden, Dresden, Germany
Jefferson Santos de Gois / Chemistry Department, Federal University of Santa Catarina,
Florianópolis, Brazil
Kostas Sarakinos / Linköping University, Linköping, Sweden
Mayur S. Sawant / Department of Mechanical Engineering, Indian Institute of Technology
Indore, Indore, India
Günter Schiller / Institute of Engineering Thermodynamics, German Aerospace Center
(DLR), Stuttgart, Germany
K.H. Schoenbach / Old Dominion University, Norfolk, Virginia, U.S.A.
Tony Schönherr / Department of Aeronautics and Astronautics, University of Tokyo,
Bunkyo, Japan
Dhaval B. Shah / Mechanical Engineering Department, Nirma University, Gujarat, India
Tao Shao / Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing,
China
A. Shashurin / School of Aeronautics and Astronautics, Purdue University, West Lafayette,
Indiana, U.S.A.
Hong Shen / Beijing National Laboratory for Molecular Sciences (BNLMS), State Key
Laboratory of Polymer Physics and Chemistry, Institute of Chemistry, Chinese Academy of
Sciences, Beijing, China
Contributors xvii

Meihua Shen / Lam Research, Fremont, California, U.S.A.

J. Leon Shohet / Department of Electrical and Computer Engineering, University of
Wisconsin-Madison, Madison, Wisconsin, U.S.A.
Robert D. Short / Mawson Institute, University of South Australia, Mawson Lakes, South
Australia, Australia
Shumaila / Department of Physics, Jamia Millia Islamia, New Delhi, India
Azher M. Siddiqui / Department of Physics, Jamia Millia Islamia, New Delhi, India
Harsh Sinha / eBeam Department, KLA-Tencor Corporation, Milpitas, California, U.S.A.
Alexander Smirnov / Department of Plasma Physics, Peter The Great Saint-Petersburg
Polytechnic University, Saint-Petersburg, Russia
G. Speranza / Bruno Kessler Foundation and Institute of Photonics and Nanotechnologies,
National Research Council, Trento, Italy
N. Spiliopoulos / Department of Physics, University of Patras, Patras, Greece
Andrey Starikovskiy / Princeton University, Princeton, New Jersey, U.S.A.
Ch. Subrahmanyam / Energy and Environmental Research Laboratory, Department of
Chemistry, Indian Institute of Technology (IIT) Hyderabad, Hyderabad, India
Jian Sun / School of Materials Science, Japan Advanced Institute of Science and
Technology, Nomi, Japan
James Szabo / Busek Co. Inc., Natick, Massachusetts, U.S.A.
Tatsuo Tabaru / National Institute of Advanced Industrial Science and Technology (AIST),
Tosu, Japan
Kazunori Takahashi / Department of Electrical Engineering, Tohoku University, Sendai,
Japan
Yusuke Takahashi / Division of Mechanical and Space Engineering, Faculty of
Engineering, Hokkaido University, Sapporo, Japan
Koichi Takaki / Department of Electrical Engineering and Computer Science, Iwate
University, Morioka, Japan
Samantha Tan / Lam Research, Fremont, California, U.S.A.
Yongming Tang / School of Electronic Science and Engineering, Southeast University,
Nanjing, China
Zhenguan Tang / Georgia Institute of Technology, Atlanta, Georgia, U.S.A.
S. Tappi / Department of Agricultural and Food Sciences, University of Bologna, Cesena,
Italy
Yoshiyuki Teramoto / Institute for Environmental Management Technology, National
Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Japan
Radovan Tiňo / Department of Wood, Pulp and Paper, Slovak University of Technology,
Bratislava, Slovakia
Angeliki Tserepi / Institute of Nanoscience and Nanotechnology, National Center for
Scientific Research (NCSR)-Demokritos, Attiki, Greece
Katerina Tsougeni / Institute of Nanoscience and Nanotechnology, National Center for
Scientific Research (NCSR) Demokritos, Attiki, Greece
Yan Tu / School of Electronic Science and Engineering, Southeast University,
Nanjing, China
Fumihiko Uesugi / National Institute of Advanced Industrial Science and Technology
(AIST), Tosu, Japan
A.B. Ustimenko / Research Institute of Experimental and Theoretical Physics, al-Farabi
Kazakh National University and NTO Plasmotechnics Ltd., Almaty, Kazakhstan
Vahid Vahedi / Lam Research, Fremont, California, U.S.A.
xviii Contributors

Stijn Van Vrekhem / Faculty of Engineering and Architecture, Department of Applied

Physics, Research Unit Plasma Technology (RUPT), Ghent University, Ghent, Belgium
Michael Vasiliev / Department of Aerospace Research, Moscow Institute of Physics and
Technology, Moscow, Russia
Tatiana Vasilieva / Department of General Chemistry, Moscow Institute of Physics and
Technology, Moscow, Russia
Baoping Wang / School of Electronic Science and Engineering, Southeast University,
Nanjing, China
Chao Wang / Center for Photonics Innovation, School of Electrical, Computer, and Energy
Engineering, Arizona State University, Tempe, Arizona, U.S.A.
Hui Wang / Department of Environmental Engineering, Hangzhou Dianzi University and
Department of Chemistry, Zhejiang University, Hangzhou, China
Mei Wang / Department of Physics and Materials Science, City University of Hong Kong,
Hong Kong and Department of Materials Science and Engineering, Shandong University,
Jinan, China
QingLi Wang / School of Materials Science and Engineering, Zhejiang University,
Hangzhou, China
Shenguo Wang / Beijing National Laboratory for Molecular Sciences (BNLMS), State Key
Laboratory of Polymer Physics and Chemistry, Institute of Chemistry, Chinese Academy of
Sciences, Beijing, China
Jason D. Whittle / Mawson Institute, University of South Australia, Mawson Lakes, South
Australia, Australia
Chalermwat Wongwanitwattana / Physics Department, Faculty of Science,
Srinakharinwirot University, Bangkok, Thailand
C.S. Wu / Institute of Materials Joining, Shandong University, Jinan, China
Yun Wu / Science and Technology on Plasma Dynamics Lab, Xi'an Jiaotong University,
Xi'an, China
Hong Xiao / KLA-Tencor Corporation, Milpitas, California, U.S.A.
Deng Xiaolong / Department of Applied Physics, Ghent University, Ghent, Belgium
Fei Yang / Beijing National Laboratory for Molecular Sciences (BNLMS), State Key
Laboratory of Polymer Physics and Chemistry, Institute of Chemistry, Chinese Academy of
Sciences, Beijing, China
Lanlan Yang / School of Electronic Science and Engineering, Southeast University,
Nanjing, China
Yu Yao / Center for Photonics Innovation, School of Electrical, Computer, and Energy
Engineering, Arizona State University, Tempe, Arizona, U.S.A.
Mitsuo Yasaka / National Institute of Advanced Industrial Science and Technology (AIST),
Tosu, Japan
Kiyoshi Yasutake / Department of Precision Science and Technology, Graduate School of
Engineering, Osaka University, Osaka, Japan
Toyonobu Yoshida / University of Tokyo, Tokyo, Japan
Mohammed Yousfi / University Paul Sabatier of Toulouse, Laplace, National Center for
Scientific Research (CNRS), Toulouse, France
Qinqin Yu / Department of Chemistry, Zhejiang University, Hangzhou, China
Ken Yukimura / Nanoelectronics Research Institute, National Institute of Advanced
Industrial Science and Technology (AIST)-Tsukuba Central, Tsukuba, Japan
Cheng Zhang / Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing,
China
Contributors xix

Lin Zhang / Nanjing University of Science and Technology, Nanjing, China

Xiong Zhang / School of Electronic Science and Engineering, Southeast University,
Nanjing, China
XiWen Zhang / School of Materials Science and Engineering, Zhejiang University,
Hangzhou, China
Xiaoming Zheng / Department of Chemistry, Zhejiang University, Hangzhou, China
Shunguan Zhu / Nanjing University of Science and Technology, Nanjing, China
WeiDong Zhu / Department of Applied Science and Technology, St. Peter’s University,
Jersey City, New Jersey, U.S.A.
S.P. Zimin / Yaroslavl State University, Yaroslavl, Russia
Contents

Editorial Advisory Board . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . vii

Contributors . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . ix
Topical Table of Contents . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . xxv
Preface . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . xxxi
About the Editor-in-Chief . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . xxxiii

Volume I
Acrylates and Methacrylates: Radical Polymerization / Thierry Fouquet and Grégory Mertz . . . . 1
Amine Monomers: Plasma and Ultraviolet Polymerization / Gaelle Aziz, Ke Vin Chan,
Nathalie De Geyter, and Rino Morent . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 14
Antimicrobial Biomedical Materials: Engineering / Anton Nikiforov, Pieter Heyse,
Deng Xiaolong, and Christophe Leys . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 26
Arc Welding / C.S. Wu and C.B. Jia . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 36
Arc-Heated Wind Tunnels / Yusuke Takahashi . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 54
Atmospheric Pressure Plasmas: Apple Treatment / A. Berardinelli, S. Tappi, P. Rocculi, and
L. Ragni . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 66
Atmospheric Pressure Plasmas: Free-Radical Movements in / Jan Benedikt . . . . . . . . . . . . . . . . 73
Atmospheric Pressure Plasmas: Low-Temperature Processes / Hiroaki Kakiuchi,
Hiromasa Ohmi, and Kiyoshi Yasutake . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 82
Atmospheric Pressure Plasmas: Polymerization / Olivier Carton, Llorenç Bautista, and
Jose Garcia-Torres . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 92
Atmospheric Pressure Plasmas: Uniform Glow Discharge / Wonho Choe and Se Youn Moon . . . . 107
Atomic Layer Etching / S.U. Engelmann . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 128
Atomic Layer Etching: Directional / Thorsten Lill, Keren J. Kanarik, Samantha Tan,
Meihua Shen, Eric Hudson, Yang Pan, Jeffrey Marks, Vahid Vahedi, and Richard A. Gottscho . . . 133
Atomic Layer Re-Deposition for Nanoscale Devices / Markus Häyrinen, Matthieu Roussey,
Arijit Bera, Markku Kuittinen, and Seppo Honkanen . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 143
Beam Plasmas: Materials Production / Michael Vasiliev and Tatiana Vasilieva . . . . . . . . . . . . . . 152
Biology: Low-Temperature Plasmas in / Mohammed Yousfi . . . . . . . . . . . . . . . . . . . . . . . . . . . . 167
Biotechnology: Plasmas in / Andrew Michelmore, Jason D. Whittle, and Robert D. Short . . . . . . . 179
Blood Coagulation: Plasma Torch / Spencer P. Kuo . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 186
Boron Trichloride Dry Etching / Anton Kobelev, Nikolay Andrianov, Yuri Barsukov, and
Alexander Smirnov . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 193
Cancer Therapy: Cold Atmospheric Pressure Plasma: / Michael Keidar . . . . . . . . . . . . . . . . . . 203
Capacitively Coupled Plasmas: Electromagnetic Effects / Denis Eremin . . . . . . . . . . . . . . . . . . . 212
Carbon-Shunting Arc Plasmas / Koichi Takaki and Ken Yukimura . . . . . . . . . . . . . . . . . . . . . . . 228
CARS Diagnostics: High-Pressure Nonequilibrium Plasmas / Walter R. Lempert and
Aaron Montello . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 237
Cell Culture: Polymerization of PMMA for / Chuan Li and J.H. Hsieh . . . . . . . . . . . . . . . . . . . 248
Cellulose-Based Materials: Plasma Modification / Zhenguan Tang, Victor Breedveld, and
Dennis Hess . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 259
Coal Combustion: Plasma-Assisted / V.E. Messerle and A.B. Ustimenko . . . . . . . . . . . . . . . . . . . 269
Cold Atmospheric Pressure Plasma: Technology / A. Shashurin . . . . . . . . . . . . . . . . . . . . . . . . 284

xxi
xxii Contents

Volume I (cont’d.)
Combinatorial Plasma Polymerization: Carbon-Based Films / L. Minati, V. Antonini,
C. Pederzolli, M. Dalla Serra, G. Bao, and G. Speranza . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 294
DC Arc Plasma Torch with Nanocarbon-Coated Electrodes / V.E. Messerle and
A.B. Ustimenko . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 307
DC Plasma: Powder Metallurgy / Rodrigo Perito Cardoso, Henrique Cezar Pavanati,
Aloisio Nelmo Klein, and Silvio Francisco Brunatto . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 317
Dental Implants: Plasma Polymerization for / Judit Buxadera-Palomero, Cristina Canal,
F. Javier Gil, and Daniel Rodriguez . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 328
Die Singulation / Kenneth D. Mackenzie, David G. Lishan, Gordon M. Grivna, and
Jason M. Doub . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 339
Dielectric Barrier Discharge (DBD) / Ronny Brandenburg . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 355
Dielectric Barrier Discharge: Biomaterials / Pieter Cools, Stijn Van Vrekhem,
Nathalie De Geyter, and Rino Morent . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 367
Dielectric Barrier Discharge: Combustion / Fanying Meng and Yixiang Duan . . . . . . . . . . . . . . . 381
Dielectric Barrier Discharge: Compact Repetitive Unipolar Nanosecond-Pulse Generators /
Tao Shao and Cheng Zhang . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 388
Dielectric Barrier Discharge: Meat Treatment / Dinesh D. Jayasena, Hyun-Joo Kim, and
Cheorun Jo . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 395
Dispenser Hollow Cathode Discharges / Angela M. Capece . . . . . . . . . . . . . . . . . . . . . . . . . . . . 405
Dusty Plasma Liquid: Non-Newtonian Behavior / O.F. Petrov, A.S. Ivanov, and V.E. Fortov . . . . . 412
Electrical Discharge Machining (EDM): Casting Process Parameters / Serajul Haque . . . . . . . . 417
Electrical Discharge Machining (EDM): Nanoparticle Generation / R.K. Sahu and
Somashekhar S. Hiremath . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 432
Electrothermal Vaporization Inductively Coupled Plasma Mass Spectrometry
(ETV-ICP-MS) / Jefferson Santos de Gois and Daniel L. G. Borges . . . . . . . . . . . . . . . . . . . 443
Embryonic Stem Cells: Plasma-Directed Differentiation / Erik Hanley, Gary Lyons,
Jason Lauer, Bruce Micales, and J. Leon Shohet . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 452
Engine Emission Control: Ozone and Plasma Desorption / Marcin Hołub . . . . . . . . . . . . . . . . . 467
Etching: Endpoint Detection / Junwei Bao . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 476
Food Packaging / P.J. Cullen, S.K. Pankaj, and C. Bueno-Ferrer . . . . . . . . . . . . . . . . . . . . . . . . . 491
Gas-Discharge Plasma: Biofilm Inactivation / Graciela Brelles-Mariño . . . . . . . . . . . . . . . . . . . 498
Glass Fibers: Improved Interfacial Adhesion / Vladimir Cech . . . . . . . . . . . . . . . . . . . . . . . . . . 502
Gliding Arc Discharge: Combustion Enhancement / Timothy Ombrello and Yiguang Ju . . . . . . . 517
Glow Discharges: Stratification / Vladimir I. Kolobov . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 529
Graphene: Plasma Etching / Jian Sun and Hiroshi Mizuta . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 540
Helicon Source for Electric Propulsion / Francis F. Chen . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 549
High E/N Discharges: Applications / Andrey Starikovskiy . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 555
High-Power Impulse Magnetron Sputtering (HiPIMS) / André Anders . . . . . . . . . . . . . . . . . . . 588
High-Pressure Optical Diagnostics / Peter J. Bruggeman . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 603
Inductively Coupled Plasma Mass Spectrometry / Yoseif Makonnen, Nausheen Sadiq, and
Diane Beauchemin . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 623
Inductively Coupled Plasma Optical Emission Spectrometry / Farhad Kaveh, Lily Huang,
and Diane Beauchemin . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 655
Inductively Coupled Plasma Sputtering: Structure of IV-VI Semiconductors / S.P. Zimin,
E.S. Gorlachev, and I.I. Amirov . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 679
Kelvin Probe / H. Sinha, J. Lauer, M. Nichols, and J.L. Shohet . . . . . . . . . . . . . . . . . . . . . . . . . . 692
Laser-Induced Plasma / Alessandro De Giacomo and Marcella Dell’Aglio . . . . . . . . . . . . . . . . . . 696
Contents xxiii

Liquids and Gas-Liquid Environments: Plasmas in / M. Magureanu and V.I. Parvulescu ...... 702
Mercury Probe / H. Sinha and J.L. Shohet . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . ....... 716
Metal Deposition: Plasma-Based Processes / Neelesh K. Jain, Mayur S. Sawant,
Sagar H. Nikam, and Suyog Jhavar . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . ....... 722
Microdischarges / K.H. Schoenbach . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . ....... 741
Microorganisms: Destruction with Nonthermal Plasma / Nicolai S. Panikov . . . . . . . . ....... 758

Volume II
Microplasma Atomic Emission Spectroscopy / Takahiro Iwai, Ken Kakegawa, Mari Aida,
Yoichi Nagata, Hidekazu Miyahara, Koichi Chiba, and Akitoshi Okino . . . . . . . . . . . . . . . . . . .. 773
Microplasmas / Alan R. Hoskinson . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .. 780
Microplasmas: Environmental and Biological Applications / Kurt H. Becker, WeiDong Zhu,
and Jose L. Lopez . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .. 791
Microwave Plasmas: Single Crystal Diamond Synthesis / Kadek W. Hemawan and
Russell J. Hemley . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 806
Microwave-Generated Fireballs / Eli Jerby . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 819
Modeling: 2-D / Prashanth Kothnur . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 833
Modeling: Electromagnetic Plasma / Shahid Rauf . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 847
Nanocrystalline Diamond Coatings / Mei Wang and Paul K. Chu . . . . . . . . . . . . . . . . . . . . . . . . 857
Nanotechnology: Plasma-Based / Kostya (Ken) Ostrikov . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 874
Negative Ion and Dust Particle-Containing Plasmas / Robert L. Merlino . . . . . . . . . . . . . . . . . . 887
Negative Ion Plasmas / Hiroshi Amemiya . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 906
NOx: Removal by Plasma Catalytic Process / Xiaoming Zheng, Hui Wang, and Qinqin Yu . . . . . . 944
Opals (2-D Colloidal Crystals): Plasma Etching of / Eser Metin Akinoglu and Michael Giersig . . 953
Ozone Injection: Plasma-Induced / Takuya Kuwahara and Masaaki Okubo . . . . . . . . . . . . . . . . . 964
Paper: Plasma Deacidification / XiWen Zhang and QingLi Wang . . . . . . . . . . . . . . . . . . . . . . . . 974
PECVD: Silicon Nitride / Deborah Neumayer . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 982
Photonic Crystals: Tunable Plasma / Lifang Dong, Weili Fan, Xuechen Li, and Yuyang Pan . . . . . 993
Plasma Bullets / Mounir Laroussi . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 997
Plasma Electron Sources / Victor Burdovitsin and Efim Oks . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1006
Plasma Flow Control / Yun Wu and Yinghong Li . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1016
Plasma Impedance in Discharges / N. Spiliopoulos and E. Amanatides . . . . . . . . . . . . . . . . . . . . 1038
Plasmonics and Surface Plasmons / Mikhail A. Kats, Yu Yao, and Chao Wang . . . . . . . . . . . . . . . 1062
PLGA: Immobilization of Fibroblast Growth Factor / Shenguo Wang, Hong Shen, Xixue Hu,
Fei Yang, and Jianzhong Bei . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .. 1083
Pollutants: Aqueous Organic, Nonthermal Degradation / P. Manoj Kumar Reddy and
Ch. Subrahmanyam . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .. 1087
Polymer Surface Modification: Plasma for Applications / Dimitrios Kontziampasis and
Maria Kitsara . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .. 1097
Polymer–Cold Plasma Interactions / Edward Bormashenko . . . . . . . . . . . . . . . . . . . . . . . . . . .. 1108
Polymeric Microfluidics: Fabricated and Modified Using Plasmas / Katerina Tsougeni,
Angeliki Tserepi, and Evangelos Gogolides . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .. 1112
Polymers: Plasma Micro-Nanotexturing and Plasma-Directed Organization /
Dimitrios Kontziampasis, Angeliki Tserepi, and Evangelos Gogolides . . . . . . . . . . . . . . . . . . . .. 1125
Polyolefin Surfaces: Functional Groups / Jörg Friedrich and Gundula Hidde . . . . . . . . . . . . . .. 1138
Powders: Plasma Spray PVD for High-Throughput Production / Makoto Kambara,
Tasuku Hideshima, Mashiro Kaga, and Toyonobu Yoshida . . . . . . . . . . . . . . . . . . . . . . . . . . .. 1176
Pulsed Inductive Plasma Acceleration: Optimization / Kurt A. Polzin . . . . . . . . . . . . . . . . . . .. 1191
xxiv Contents

Volume II (cont’d.)
Pulsed Plasmas: Nanoparticles and Thin Film Synthesis / Iris Pilch and Kostas Sarakinos . . . . . 1201
Quantum Plasmas / Fernando Haas . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1216
Radar Cross-Section Reduction: Stealth Technology / Bhaskar Chaudhury . . . . . . . . . . . . . . . . . 1224
Re-Entry Vehicles: Communication through Plasma / Minkwan Kim . . . . . . . . . . . . . . . . . . . . . 1236
Root Canal Treatment / XinPei Lu . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1249
Scanning Electron Microscopy / Harsh Sinha, Anadi Bhatia, Hong Xiao, Olivier Moreau,
Paul MacDonald, and Cecelia Campochiaro . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1255
Seed Treatment: Cold Plasma / Yuan-Hua Dong, Jian-Gang Li, and Ling Li . . . . . . . . . . . . . . . . 1269
Semiconductor (III-V) Thin Films: Plasma Etching / S.J. Pearton and F. Ren . . . . . . . . . . . . . . 1271
Semiconductor-Bridge Plasma / Lin Zhang, Shunguan Zhu, Hongyan Feng, and Peng Ma . . . . . . 1280
Semiconductors: Etching with Sulfur Hexafluoride (SF6) / Chalermwat Wongwanitwattana . . . . . 1288
Sewage Sludge: Plasma Gasification of / Antonios John Mountouris . . . . . . . . . . . . . . . . . . . . . . 1295
Shadow Mask Plasma Display Panel / Yan Tu, Baoping Wang, Xiong Zhang, Lanlan Yang,
Qing Li, and Yongming Tang . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1305
Solid Oxide Fuel Cells (SOFC): Advanced Production Techniques / Rudolf Henne,
Johannes Arnold, Robert Ruckdäschel, Günter Schiller . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1314
Space Plasma Thrusters: Magnetic Nozzles for / Mario Merino and Eduardo Ahedo . . . . . . . . . . 1329
Spacecraft Charging / Shu T. Lai and Kerri Cahoy . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1352
Steam Reforming / Gerardo Diaz . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1367
Strip Hollow Cathode Plasmas: PECVD and Thermochemical Treatment / Krasimir Nikolov
and Claus-Peter Klages . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1376
Taguchi Method: Plasma Cutting Parameters / Dhaval B. Shah, Shashikant Joshi, and
Ashil Patel . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1389
Textiles / Maja Radetic . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1396
Textiles: Nanostructured Plasma Coatings / Dirk Hegemann . . . . . . . . . . . . . . . . . . . . . . . . . . . 1408
Textiles: PET, Poly-DADMAC-Containing Fabrics / Tarek Salem . . . . . . . . . . . . . . . . . . . . . . . 1417
Thermal Plasmas: Boundary Conditions on Heat Flux / L. Pekker . . . . . . . . . . . . . . . . . . . . . . 1424
Thin Films: Polyaniline and Poly(3-methylthiophene) / G.B.V.S. Lakshmi, Shumaila,
Sameen Ahmed Khan, and Azher M. Siddiqui . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1442
Thrusters: Ablative Pulsed, Plasma Acceleration in / Tony Schönherr . . . . . . . . . . . . . . . . . . . . 1452
Thrusters: Current-Free Plasma / Kazunori Takahashi . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1462
Thrusters: Iodine Plasma / James Szabo . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1474
Thrusters: Pulsed Plasmas / Iain D. Boyd . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1484
Vacuum Arc Cathode Spots / André Anders . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1492
Vacuum Ultraviolet (VUV) Sources / He Ren . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1499
Volatile Organic Compounds Decomposition / Hyun-Ha Kim, Yoshiyuki Teramoto,
Nobuaki Negishi, and Atsushi Ogata . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1504
Wafer Movement and Micro-Arc Discharges: Detection / Yuji Kasashima, Tatsuo Tabaru,
Mitsuo Yasaka, and Fumihiko Uesugi . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1517
Wide Bandgap Materials: Plasma Etching / Huseyin Ekinci . . . . . . . . . . . . . . . . . . . . . . . . . . . 1530
Wood Surfaces: Plasma Activation / Jozef Ráhel and Radovan Tiňo . . . . . . . . . . . . . . . . . . . . . . 1541
Wool: Low-Temperature Plasma Treatment of / Chi-wai Kan . . . . . . . . . . . . . . . . . . . . . . . . . . 1552
Topical Table of Contents

Aerospace
High E/N Discharges: Applications / Andrey Starikovskiy . . . . . . . . . . . . . . . . . . . . . . . . . . . 555
Radar Cross-Section Reduction: Stealth Technology / Bhaskar Chaudhury . . . . . . . . . . . . . . 1224

Spacecraft
Re-Entry Vehicles: Communication through Plasma / Minkwan Kim . . . . . . . . . . . . . . . . . . 1236
Spacecraft Charging / Shu T. Lai and Kerri Cahoy . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1352

Thrusters
Helicon Source for Electric Propulsion / Francis F. Chen . . . . . . . . . . . . . . . . . . . . . . . . . . 549
Pulsed Inductive Plasma Acceleration: Optimization / Kurt A. Polzin . . . . . . . . . . . . . . . . . 1191
Thrusters: Ablative Pulsed, Plasma Acceleration in / Tony Schönherr . . . . . . . . . . . . . . . . . 1452
Thrusters: Current-Free Plasma / Kazunori Takahashi . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1462
Thrusters: Iodine Plasma / James Szabo . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1474
Thrusters: Pulsed Plasmas / Iain D. Boyd . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1484
Space Plasma Thrusters: Magnetic Nozzles for / Mario Merino and Eduardo Ahedo . . . . . . . 1329

Atmospheric Pressure Discharges

Atmospheric Pressure Plasmas: Apple Treatment / A. Berardinelli, S. Tappi, P. Rocculi, and
L. Ragni . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 66
Atmospheric Pressure Plasmas: Free-Radical Movements in / Jan Benedikt . . . . . . . . . . . . . 73
Atmospheric Pressure Plasmas: Low-Temperature Processes / Hiroaki Kakiuchi,
Hiromasa Ohmi, and Kiyoshi Yasutake . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 82
Atmospheric Pressure Plasmas: Uniform Glow Discharge / Wonho Choe and Se Youn Moon . 107
Atmospheric Pressure Plasmas: Polymerization / Olivier Carton, Llorenµ Bautista, and
Jose Garcia-Torres . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 92
Dielectric Barrier Discharge: Compact Repetitive Unipolar Nanosecond-Pulse Generators /
Tao Shao and Cheng Zhang . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 388
Dielectric Barrier Discharge: Meat Treatment / Dinesh D. Jayasena, Hyun-Joo Kim, and
Cheorun Jo . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 395
Volatile Organic Compounds Decomposition / Hyun-Ha Kim, Yoshiyuki Teramoto,
Nobuaki Negishi, and Atsushi Ogata . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1504

Biology
Antimicrobial (Inhibitory) Applications
Antimicrobial Biomedical Materials: Engineering / Anton Nikiforov, Pieter Heyse,
Deng Xiaolong, and Christophe Leys . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 26
Biology: Low-Temperature Plasmas in / Mohammed Yousfi . . . . . . . . . . . . . . . . . . . . . . . . . 167
Food Packaging / P.J. Cullen, S.K. Pankaj, and C. Bueno-Ferrer . . . . . . . . . . . . . . . . . . . . . . 491
Gas-Discharge Plasma: Biofilm Inactivation / Graciela Brelles-Mariño . . . . . . . . . . . . . . . . 498
Microorganisms: Destruction with Nonthermal Plasma / Nicolai S. Panikov . . . . . . . . . . . . 758
Pollutants: Aqueous Organic, Nonthermal Degradation / P. Manoj Kumar Reddy and
Ch. Subrahmanyam . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . ..... 1087

xxv
xxvi Topical Table of Contents

Biology (cont’d.)
Technology
Biotechnology: Plasmas in / Andrew Michelmore, Jason D. Whittle, and Robert D. Short . . . . 179
Seed Treatment: Cold Plasma / Yuan-Hua Dong, Jian-Gang Li, and Ling Li . . . . . . . . . . . . . 1269

Human Health
Blood Coagulation: Plasma Torch / Spencer P. Kuo . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 186
Cancer Therapy: Cold Atmospheric Pressure Plasma: / Michael Keidar . . . . . . . . . . . . . . . 203
Cell Culture: Polymerization of PMMA for / Chuan Li and J.H. Hsieh . . . . . . . . . . . . . . . . 248
Cold Atmospheric Pressure Plasma: Technology / A. Shashurin . . . . . . . . . . . . . . . . . . . . . 284
Dental Implants: Plasma Polymerization for / Judit Buxadera-Palomero, Cristina Canal,
F. Javier Gil, and Daniel Rodriguez . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 328
Embryonic Stem Cells: Plasma-Directed Differentiation / Erik Hanley, Gary Lyons,
Jason Lauer, Bruce Micales, and J. Leon Shohet . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 452
Plasmonics and Surface Plasmons / Mikhail A. Kats, Yu Yao, and Chao Wang . . . . . . . . . . . . 1062
PLGA: Immobilization of Fibroblast Growth Factor / Shenguo Wang, Hong Shen, Xixue Hu,
Fei Yang, and Jianzhong Bei . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1083
Root Canal Treatment / XinPei Lu . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1249

Textiles and Cellulose-Based Materials

Cellulose-Based Materials: Plasma Modification / Zhenguan Tang, Victor Breedveld, and
Dennis Hess . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 259
Textiles / Maja Radetic . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1396
Textiles: Nanostructured Plasma Coatings / Dirk Hegemann . . . . . . . . . . . . . . . . . . . . . . . . 1408
Textiles: PET, Poly-DADMAC-Containing Fabrics / Tarek Salem . . . . . . . . . . . . . . . . . . . . 1417
Wood Surfaces: Plasma Activation / Jozef Ráhel and Radovan Tiňo . . . . . . . . . . . . . . . . . . . 1541
Wool: Low-Temperature Plasma Treatment of / Chi-wai Kan . . . . . . . . . . . . . . . . . . . . . . . 1552

Chemistry
Beam Plasmas: Materials Production / Michael Vasiliev and Tatiana Vasilieva . . . . . . . . . . . 152
DC Plasma: Powder Metallurgy / Rodrigo Perito Cardoso, Henrique Cezar Pavanati,
Aloisio Nelmo Klein, and Silvio Francisco Brunatto . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 317
Steam Reforming / G. Diaz . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1367

Combustion
Coal Combustion: Plasma-Assisted / V.E. Messerle and A.B. Ustimenko . . . . . . . . . . . . . . . . 269
Dielectric Barrier Discharge: Combustion / Fanying Meng and Yixiang Duan . . . . . . . . . . . . 381
Engine Emission Control: Ozone and Plasma Desorption / Marcin Holub . . . . . . . . . . . . . . 467
Gliding Arc Discharge: Combustion Enhancement / Timothy Ombrello and Yiguang Ju . . . . 517
Ozone Injection: Plasma-Induced / Takuya Kuwahara and Masaaki Okubo . . . . . . . . . . . . . . 964
Semiconductor-Bridge Plasma / Lin Zhang, Shunguan Zhu, Hongyan Feng, and Peng Ma . . . 1280
Solid Oxide Fuel Cells (SOFC): Advanced Production Techniques / Rudolf Henne,
Johannes Arnold, Robert Ruckdäschel, and Günter Schiller . . . . . . . . . . . . . . . . . . . . . . . ... 1314

Control Systems
Plasma Flow Control / Yun Wu and Yinghong Li . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1016
Topical Table of Contents xxvii

Deposition
Atomic Layer Re-Deposition for Nanoscale Devices / Markus Häyrinen, Matthieu Roussey,
Arijit Bera, Markku Kuittinen, and Seppo Honkanen . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 143
Glass Fibers: Improved Interfacial Adhesion / Vladimir Cech . . . . . . . . . . . . . . . . . . . . . . . 502
Metal Deposition: Plasma-Based Processes / Neelesh K. Jain, Mayur S. Sawant, Sagar H. Nikam,
and Suyog Jhavar . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 722
PECVD: Silicon Nitride / Deborah Neumayer . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 982
Strip Hollow Cathode Plasmas: PECVD and Thermochemical Treatment / Krasimir Nikolov
and Claus-Peter Klages . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1376

Diagnostics
High-Pressure Optical Diagnostics / Peter J. Bruggeman . . . . . . . . . . . . . . . . . . . . . . . . . . . 603
Inductively Coupled Plasma Optical Emission Spectrometry / Farhad Kaveh, Lily Huang, and
Diane Beauchemin . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 655

Electric Field Measurements

CARS Diagnostics: High-Pressure Nonequilibrium Plasmas / Walter R. Lempert and
Aaron Montello . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 237

Mass Spectrometry
Inductively Coupled Plasma Mass Spectrometry / Yoseif Makonnen, Nausheen Sadiq, and
Diane Beauchemin . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 623
Electrothermal Vaporization Inductively Coupled Plasma Mass Spectrometry
(ETV-ICP-MS) / Jefferson Santos de Gois and Daniel L.G. Borges . . . . . . . . . . . . . . . . . 443

Spectroscopy
Microplasma Atomic Emission Spectroscopy / Takahiro Iwai, Ken Kakegawa, Mari Aida,
Yoichi Nagata, Hidekazu Miyahara, Koichi Chiba, and Akitoshi Okino . . . . . . . . . . . . . . . . . . 773

Surface Measurements
Kelvin Probe / H. Sinha, J. Lauer , M. Nichols, and J. Leon Shohet . . . . . . . . . . . . . . . . . . . . 692
Mercury Probe / H. Sinha and J. Leon Shohet . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 716
Scanning Electron Microscopy / Harsh Sinha, Anadi Bhatia, Hong Xiao, Olivier Moreau,
Paul MacDonald, and Cecelia Campochiaro . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1255

Dusty Plasmas
Dusty Plasma Liquid: Non-Newtonian Behavior / O.F. Petrov, A.S. Ivanov, and
V.E. Fortov . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 412
Negative Ion and Dust Particle-Containing Plasmas / Robert L. Merlino . . . . . . . . . . . . . . . 887

Environment
NOx: Removal by Plasma Catalytic Process / Xiaoming Zheng, Hui Wang, and Qinqin Yu . . . 944

Waste
Sewage Sludge: Plasma Gasification of / Antonios John Mountouris . . . . . . . . . . . . . . . . . . . 1295
xxviii Topical Table of Contents

Etching
Atomic Layer Etching / Sebastian U. Engelmann . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 128
Atomic Layer Etching: Directional / Thorsten Lill, Keren J. Kanarik, Samantha Tan,
Meihua Shen, Eric Hudson, Yang Pan, Jeffrey Marks, Vahid Vahedi, and
Richard A. Gottscho . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 133
Boron Trichloride Dry Etching / Anton Kobelev, Nikolay Andrianov, Yuri Barsukov, and
Alexander Smirnov . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 193
Etching: Endpoint Detection / Junwei Bao . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 476
Graphene: Plasma Etching / Jian Sun and Hiroshi Mizuta . . . . . . . . . . . . . . . . . . . . . . . . . . 540
Opals (2-D Colloidal Crystals): Plasma Etching of / Eser Metin Akinoglu and Michael Giersig 953
Semiconductor (III-V) Thin Films: Plasma Etching / S.J. Pearton and F. Ren . . . . . . . . . . . 1271
Semiconductors: Etching with Sulfur Hexafluoride (SF6) / Chalermwat Wongwanitwattana . . . 1288
Wafer Movement and Micro-Arc Discharges: Detection / Yuji Kasashima, Tatsuo Tabaru,
Mitsuo Yasaka, and Fumihiko Uesugi . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1517
Wide Bandgap Materials: Plasma Etching / Huseyin Ekinci . . . . . . . . . . . . . . . . . . . . . . . . 1530

Fundamentals
Capacitively Coupled Plasmas: Electromagnetic Effects / Denis Eremin . . . . . . . . . . . . . . . . 212
Laser-Induced Plasma / Alessandro De Giacomo and Marcella Dell’Aglio . . . . . . . . . . . . . . . 696
Negative Ion Plasmas / Hiroshi Amemiya . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 906
Plasma Impedance in Discharges / N. Spiliopoulos and E. Amanatides . . . . . . . . . . . . . . . . . 1038
Plasmonics and Surface Plasmons / Mikhail A. Kats, Yu Yao, and Chao Wang . . . . . . . . . . . . 1062
Quantum Plasmas / Fernando Haas . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1216

Materials Processing
Photonic Crystals: Tunable Plasma / Lifang Dong, Weili Fan, Xuechen Li, and Yuyang Pan . . . 993

Microfabrication
Beam Plasmas: Materials Production / Michael Vasiliev and Tatiana Vasilieva . . . . . . . . . . . 152

Microwave
Microwave-Generated Fireballs / Eli Jerby . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 819
Microwave Plasmas: Single Crystal Diamond Synthesis / Kadek W. Hemawan and
Russell J. Hemley . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 806

Modeling
Modeling: 2-D / Prashanth Kothnur . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 833
Modeling: Electromagnetic Plasma / Shahid Rauf . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 847

Plasma Devices
Atomic Layer Re-Deposition for Nanoscale Devices / Markus Häyrinen, Matthieu Roussey,
Arijit Bera, Markku Kuittinen, and Seppo Honkanen . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 143
Die Singulation / Kenneth D. Mackenzie, David G. Lishan, Gordon M. Grivna, and Jason M. Doub 339

Displays
Shadow Mask Plasma Display Panel / Yan Tu, Baoping Wang, Xiong Zhang, Lanlan Yang,
Qing Li, and Yongming Tang . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1305
Another random document with
no related content on Scribd:
PULLMAN.

A decision of the Supreme Court of Illinois, rendered early in

1899, deprives the Pullman Car Company of the legal right to
own and conduct the affairs of the town of Pullman, Illinois.
The effect is understood to be that the town will be
incorporated with Chicago.

PUNJAB, Formation of a new province from districts of the.

See (in this volume)

INDIA: A. D. 1901 (FEBRUARY).

PUPIN, Dr. Michael I.:

Improvement in long-distance telephony.

See (in this volume)

SCIENCE, RECENT: ELECTRICAL.

Q.

QUEBEC, Province.

See (in this volume)

CANADA.

QUEENS COUNTY:
Incorporation in Greater New York.

See (in this volume)

NEW YORK CITY: A. D. 1896-1897.

QUEENSLAND.

See (in this volume)

AUSTRALIA; and CONSTITUTION OF AUSTRALIA.
QUINCY, Josiah:
Progressive measures as Mayor of Boston.

See (in this volume)

BOSTON: A. D. 1895-1899.

R.

RACES, European, The expansion of.

See (in this volume)

NINETEENTH CENTURY: EXPANSION.

RAILWAY, The Anatolian.

Extension to the Persian Gulf.

See (in this volume)

TURKEY: A. D. 1899 (NOVEMBER).

RAILWAY, Cape to Cairo.

"A line now [1899] runs northward from Cape Town to Bulawayo,
in Rhodesia, a distance of 1,360 miles, and is being pushed
still farther northward. From Bulawayo to Lake Tanganyika is
about 1,000 miles; and this Mr. Rhodes hopes to reach by 1905.
Lake Tanganyika is 410 miles long; and it is likely that its
waters will be utilized for a time at least for transferring
northwardly the freights and passengers reaching its southern
end. Meantime the railroad from Cairo is being pushed
southwardly to meet the line which is coming from the Cape
northwardly. It has already been constructed to Atbara, where
American contractors have just finished the steel bridge in a
time which British bridge-builders considered impossible; and
the line is being pushed forward to Khartoum from that point.
Khartoum is 1,300 miles from Cairo; so that when work on the
section from Atbara to Khartoum is completed, as it will be
within a few months, the two gaps to be filled in will be from
 Khartoum to the north end of Lake Tanganyika, a distance of
1,700 miles, and the 950 miles from the south end of Lake
Tanganyika to Bulawayo; i. e., 2,700 miles in all. Thus, of
the necessary land length, assuming that at least the 410
miles length of Lake Tanganyika will be at first utilized,
about one-half will be finished on the completion of the
section from Atbara to Khartoum, within the next few months.
The remaining 2,700 miles will, it is estimated, cost
$60,000,000; and Mr. Rhodes confidently predicts its
completion before the year 1910."

O. P. Austin,
Africa: Present and Future
(Forum, December, 1899).

See, also (in this volume)

AFRICA: A. D. 1899.

Of course, the plans and calculations of Mr. Cecil Rhodes have

been seriously interfered with by the South African War. He
may have anticipated the war, but not the length nor the
effects of it.

RAILWAY, Haifa to Damascus and Bagdad.

See (in this volume)

JEWS: A. D. 1899.

RAILWAY, The Intercontinental, or "Three Americas."

"One of the important results of the International American

Conference, held in Washington in 1889-90, was its
recommendation that an International Commission be created to
ascertain the feasibility, the cost, and the available
location for a railroad connecting the countries of South and
Central America with Mexico and the United States. This
recommendation was cordially indorsed by Secretary Blaine in
 submitting the report to President Harrison, who transmitted
it to Congress, asking that an appropriation be made to
commence the surveys. In the same act which authorized the
establishment of the Bureau of the American Republics—the
Diplomatic and Consular Appropriation Act of July 14, 1890—the
Intercontinental Railway Commission was created.
{421}
In this act it was provided that three Commissioners on the
part of the United States should be appointed by the
President, with the advice and consent of the Senate, who were
to act with representatives of the other American Republics to
devise plans for carrying out the objects recommended by the
International American Conference. The Commission organized
December 4, 1890, and at once set about the equipping of the
surveying parties to make the necessary topographical
examination. The United States representatives on the
Commission were practical railroad men—A. J. Cassatt, Henry G.
Davis, and R. C. Kerens, and eleven other Republics were
represented on the Commission. The report just issued [March,
1899] is in four volumes, with four sets of maps and profiles,
exhibiting the surveys and examination of the country that
were made from Mexico through Central America to Colombia,
Ecuador, and Peru, in South America. In addition to the
personal observations in South America, the officers making
the reports also gathered from the best obtainable sources
geographical, railroad, and other information relating to
Bolivia, Argentina, Brazil, Paraguay, Uruguay, Chile, and
Venezuela. The report gives the proposed distances as follows:

Central American division, from Ayutla, Guatemala, on the

Mexican border, to Rio Golfito, Colombia, 1,043 miles; from
Rio Golfito to Buenos Aires, Argentina, 5,446.76 miles;
through the United States from New York to Laredo, Texas,
2,094 miles; and from that point, through Mexico to Ayutla,
Guatemala, 1,644.3 miles; making a total of 10,228.06 miles,
including the lines already in operation in the different
countries. The extent of railway to be constructed is a little
 over one-half the total, being 5,456.13 miles. An estimate is
given of the cost for grading, masonry, and bridges of that
portion of the line which must be constructed to complete the
connections, which amounts to $174,290,271.84."

Bureau of American Republics,

Bulletin, March, 1899.

As now surveyed, from New York City to Buenos Ayres, it will

be 10,221 miles long, and to finish and equip it will cost at
least $200,000,000. This length and cost will also be
increased when the line is extended through Patagonia to the
southern limits of South America. The complete surveys … prove
that a practicable route can be found and the road built
within a reasonable time. The route of this road can be traced
on the map, while the following table shows the distances, the
miles built, and the gaps to be filled:

Built. Proposed.
Total.
United States. 2,094 …
2,094
Mexico 1,183 461
1,644

Total North America. 3,277 461

3,738

---------

Guatemala. 43 126
169
San Salvador. 64 166
230
Honduras. … 71
71
Nicaragua. 103 106
209
Costa Rica. … 360
360

Total Central America. 210 829

1,039

Colombia. … 1,354
1,354
Ecuador. … 658
658
Peru. 151 1,833
1,784
Bolivia. 195 392
587
Argentina. 936 125
1,061

Total South America. 1,282 4,769

5,444

Grand total. 4,769 5,452

10,221

"The demands of trade may compel early construction of this

railroad. It is doubtful if a remunerative commerce can be
built up between North and South America by ship. The
conformation of the eastern coast of South America compels a
long detour to the east, and brings a ship almost as near to
 the ports of Europe as to the ports of the United States. The
exports of South America, being mainly agricultural, will find
a readier sale in Europe than in this country, and when they
are exchanged for the cheap manufactured goods of that
continent the conditions for trade are supplied. If, for these
reasons, this country can not build up a commerce with South
America by water, a quicker means of transit must be had, such
as the Pan-American Railway would provide. The obstacles to be
overcome are great. They surpass the difficulties in the way of
the Siberian or the 'Cape to Cairo' road, but the results will
be correspondingly greater.

"South America has greater undeveloped resources than any

other continent. Its agricultural possibilities are boundless.
It has the greatest rivers in the world; its soil can produce
any crop grown on the earth, and its mines of gold, silver,
and coal have been scarcely touched. A railroad which would
traverse the coffee lands of the Central American States, pass
through the mines of Peru, and penetrate the rich pampas of
Brazil and Argentina, must have great possibilities before it.
The products of the three great valleys of the Orinoco, the
Amazon, and the Paraguay rivers would find a market by means
of it, and the riches of the mines of the Incas be shown to
surpass those of California and South Africa."

Bureau of American Republics,

Bulletin, December, 1899.

RAILWAY, The Tehuantepec.

See (in this volume)

MEXICO: A. D. 1898-1900.

RAILWAY, The Three Americas.

See, above,
RAILWAY, INTERCONTINENTAL.
RAILWAY, Trans-Siberian.

See (in this volume)

RUSSIA IN ASIA: A. D. 1891-1900.

RAILWAY, The Uganda, or Mombasa-Victoria.

See (in this volume)

UGANDA RAILWAY.

RAILWAYS: in Africa.

See (in this volume)

AFRICA: A. D. 1899.

RAILWAYS: American Inter-State.

Arbitration of industrial disputes.

See (in this volume)

UNITED STATES OF AMERICA:
A. D. 1898 (JUNE).

RAILWAYS: Concessions in China.

See (in this volume)

CHINA: A. D. 1895;
1897 (MAY-JUNE);
1897 (NOVEMBER);
1898 (FEBRUARY-DECEMBER);
1898 (MARCH);
1898 (APRIL-AUGUST);
1898 (MAY);
1899 (MARCH-APRIL).

RAILWAYS:
Russian projects in Persia.
 See (in this volume)
RUSSIA IN ASIA: A. D. 1900.

{422}

RAILWAYS:
State purchase in Switzerland.

See (in this volume)

SWITZERLAND: A. D. 1894-1898.

RAINES LAW, The.

See (in this volume)

NEW YORK STATE: A. D. 1896-1897.

RAMAPO WATER CONTRACT, The.

See (in this volume)

NEW YORK CITY: A. D. 1899-1900.

RANAVALOMANJAKA, Queen.

See (in this volume)

MADAGASCAR.

RAND, Gold fields of the.

See (in this volume)

SOUTH AFRICA (THE TRANSVAAL): A. D. 1885-1890.

RECIPROCITY:
Treaties under the Dingley Tariff Act.

See (in this volume)

UNITED STATES OF AMERICA: A. D. 1899-1901.
RECONCENTRADOS.

(See in this volume)

CUBA: A. D. 1896-1897;
and 1897-1898 (DECEMBER-MARCH).

RED CROSS SOCIETY, The:

Relief work in Armenia and Cuba.

See (in this volume)

TURKEY: A. D. 1896 (JANUARY-MARCH);
and CUBA: A. D. 1896-1897.

REFERENDUM, The:
In Minnesota.

See (in this volume)

MINNESOTA: A. D. 1896.

REFERENDUM, The:
Introduction in South Dakota.

See (in this volume)

SOUTH DAKOTA: A. D. 1898.

REFERENDUM, The:
Its exercise in Switzerland.

See (in this volume)

SWITZERLAND: A. D. 1894-1898.

REID CONTRACT, The.

See (in this volume)

NEWFOUNDLAND: A. D. 1897-1900; and 1899-1901.
REITFONTEIN, Battle of.

See (in this volume)

SOUTH AFRICA (THE FIELD OF WAR):
A. D. 1899 (OCTOBER-DECEMBER).

RELIGIOUS ORDERS, Bill to regulate, in France.

See (in this volume)

FRANCE: A. D. 1901 (JANUARY).

REPRESENTATIVES:
Reapportionment in the Congress of the United States.

See (in this volume)

UNITED STATES OF AMERICA: A. D. 1901 (JANUARY).

REPUBLICAN PARTY, The,

in the U. S. Presidential elections, 1896 and 1900.

See (in this volume)

UNITED STATES OF AMERICA:
A. D. 1896 (JUNE-NOVEMBER);
and 1900 (MAY-NOVEMBER).

RESERVOIRS, Nile.

See (in this volume)

EGYPT: A. D. 1898-1901.

RHINE-ELBE CANAL PROJECT, The.

See (in this volume)

GERMANY: A. D. 1899 (AUGUST);
and 1901 (JANUARY).

RHODE ISLAND: A. D. 1900.

 Newport no longer a capital city.

At the election in November, 1900, a constitutional amendment

was adopted which makes Providence alone the capital city of
Rhode Island. Newport had been one of the capitals since the
colonies of Rhode Island and Providence Plantations were
united.

RHODES, Cecil John:

Founder of the British South Africa Company.

See (in this volume)

SOUTH AFRICA (THE TRANSVAAL): A. D. 1884-1894.

RHODES, Cecil John:

Master spirit of the British South Africa Company.
His name given to its dominions.

See (in this volume)

SOUTH AFRICA (BRITISH SOUTH AFRICA COMPANY):
A. D. 1894-1895.

RHODES, Cecil John:

Participation in Uitlander revolutionary conspiracy at
Johannesburg, leading to Jameson Raid.
Resignation of Cape Colony premiership.

See (in this volume)

SOUTH AFRICA (THE TRANSVAAL): A. D. 1895-1896.

RHODES, Cecil John:

Dealing with Matabele revolt.

See (in this volume)

SOUTH AFRICA (RHODESIA):
A. D. 1896 (MARCH-SEPTEMBER).
RHODES, Cecil John:
Resignation from the Board of the British South Africa
Company.

See (in this volume)

SOUTH AFRICA
(BRITISH SOUTH AFRICA COMPANY): A. D. 1896 (JUNE).

RHODES, Cecil John:

Accused by the Cape Colony Assembly of complicity in the
Jameson Raid.

See (in this volume)

SOUTH AFRICA (CAPE COLONY): A. D. 1896 (JULY).

RHODES, Cecil John:

Testimony before British Parliamentary Committee on the
Jameson Raid.
The Committee's report.

See (in this volume)

SOUTH AFRICA (THE TRANSVAAL):
A. D. 1897 (FEBRUARY-JULY).

RHODES, Cecil John:

In Cape Colony politics.

See (in this volume)

SOUTH AFRICA (CAPE COLONY): A. D. 1898.

RHODES, Cecil John:

Projection of a Cape to Cairo Railway.

See (in this volume)

RAILWAY, CAPE TO CAIRO;
and AFRICA: A. D. 1899.
RHODES, Cecil John:
Beleaguered in Kimberley.

See (in this volume)

SOUTH AFRICA (THE FIELD OF WAR):
A. D. 1899 (OCTOBER-NOVEMBER).

RHODES, Cecil John:

Projection of a Cape to Cairo Telegraph.

See (in this volume)

TELEGRAPH, CAPE TO CAIRO.

RHODESIA: A. D. 1896 (March-September).

Revolt of the Matabeles.

See (in this volume)

SOUTH AFRICA (RHODESIA):
A. D. 1896 (MARCH-SEPTEMBER).

RHODESIA: A. D. 1896 (July).

Parliamentary investigation of British South Africa Company.

See (in this volume)

SOUTH AFRICA (BRITISH SOUTH AFRICA COMPANY):
A. D. 1896 (JULY).

RHODESIA: A. D. 1897.
Report on compulsory native labor.

See (in this volume)

SOUTH AFRICA (BRITISH SOUTH AFRICA COMPANY):
A. D. 1897 (JANUARY).

RHODESIA: A. D. 1898.
Reorganized administration.
 See (in this volume)
SOUTH AFRICA
(RHODESIA AND THE BRITISH SOUTH AFRICA COMPANY):
A. D. 1898 (FEBRUARY).

RHODESIA: A. D. 1900.
Protectorate proclaimed over Barotsiland.

See (in this volume)

SOUTH AFRICA (RHODESIA): A. D. 1900 (SEPTEMBER).

RIO PRIETO, Engagement at the.

See (in this volume)

UNITED STATES OF AMERICA:
A. D. 1898 (JULY-AUGUST; PORTO RICO).

RIZAL, Dr. José.

See (in this volume)

PHILIPPINE ISLANDS: A. D. 1896-1898.

ROBERTS, Field Marshal, Lord (Sir Frederick Sleigh):

In the South African War.

See (in this volume)

SOUTH AFRICA (THE FIELD OF WAR):
A. D. 1900 (JANUARY-FEBRUARY), and after.

ROBINSON, Sir Hercules:

British High Commissioner in South Africa.

See (in this volume)

SOUTH AFRICA (THE TRANSVAAL):
A. D. 1896 (JANUARY-APRIL).

ROMAN CATHOLIC CHURCH, The.

 See PAPACY.

ROMAN CATHOLICS:
Protest of British Peers against the
Declaration required from the Sovereign.

See (in this volume)

ENGLAND: A. D. 1901 (FEBRUARY).

{423}

ROMAN CATHOLICS:
Victory in Belgium.

See (in this volume)

BELGIUM: A. D. 1894-1895.

ROMAN LAW:
Superseded in Germany.

See (in this volume)

GERMANY: A. D. 1900 (JANUARY).

ROME:
The likeness of its early settlement shown by excavations
at Antemnæ.

See (in this volume)

ARCHÆOLOGICAL RESEARCH: ITALY.

RÖNTGEN, Wilhelm Konrad:

Discovery of the X rays.

See (in this volume)

SCIENCE, RECENT: CHEMISTRY AND PHYSICS.
ROOSEVELT, Theodore:
Lieutenant-Colonel of the Regiment of Rough Riders.

See (in this volume)

UNITED STATES OF AMERICA: A. D. 1898 (APRIL-MAY).

ROOSEVELT, Theodore:
Elected Vice President of the United States.

See (in this volume)

UNITED STATES OF AMERICA: A. D. 1900 (MAY-NOVEMBER).

ROSEBERY, Earl of:

Prime minister.
Remarks on the "predominant member."

See (in this volume)

ENGLAND: A. D. 1894-1895.

ROSEBERY, Earl of:

Tribute to Mr. Gladstone.

See (in this volume)

ENGLAND: A. D. 1898 (MAY).

ROSEBERY, Earl of:

Tribute to Queen Victoria.

See (in this volume)

ENGLAND: A. D. 1901 (JANUARY).

ROUGH RIDERS, The.

See (in this volume)

UNITED STATES OF AMERICA:
A. D. 1898 (APRIL-MAY).
ROUGH RIDERS, The.
At Santiago.

See (in this volume)

UNITED STATES OF AMERICA: A. D. 1898 (JUNE-JULY).

ROUMANIA.

See (in this volume)

BALKAN AND DANUBIAN STATES;
and TURKEY: A. D. 1899-1901.

ROYAL NIGER COMPANY, The.

See (in this volume)

NIGERIA: A. D. 1882-1899.

ROYAL NIGER COMPANY, The.

Transfer of territories to the British crown.

See (in this volume)

NIGERIA: A. D. 1899.

RUDINI, Marquis di:

Resignation of Ministry.

See (in this volume)

ITALY: A. D. 1898 (MARCH-JUNE).

RUMANIA.

See (in this volume)

BALKAN AND DANUBIAN STATES;
and TURKEY: A. D. 1899-1901.

RUSSIA: A. D. 1895.
Agreement with Great Britain concerning the frontier of
 Afghanistan and spheres of influence in the Pamir region.

See (in this volume)

AFGHANISTAN: A. D. 1895.

RUSSIA: A. D. 1895.
Alliance with France.

See (in this volume)

FRANCE: A. D. 1895.

RUSSIA: A. D. 1895.
Treaty with China giving railway and other privileges and
rights in Manchuria.

See (in this volume)

CHINA: A. D. 1895.

RUSSIA: A. D. 1896 (May-June).

Coronation of the Tzar.

The Tzar Nicholas II., who succeeded his father, Alexander

III., on the death of the latter, November 1, 1894, was not
formally crowned until May 26, 1896. The splendid festivities
of the occasion lasted from May 18 until June, and were
attended by a brilliant assembly of princes and high officials
from all parts of the world. They were saddened by a frightful
calamity on the 31st of May, when an attempt was made to
distribute gifts of food and drink to a vast multitude of
nearly half a million people, on Khodynskoye plain. Adequate
measures for controlling the pressure of the crowd had not
been taken, and nearly 3,000 were suffocated or trampled to
death.

RUSSIA: A. D. 1897.
Relaxations of oppressive laws.
 Several important relaxations of oppressive laws were
commanded by the Tzar in the course of the year. By one, sons
of the marriage of an orthodox Russian with one of another
creed were allowed to be brought up in the religion of the
father and daughters in that of the mother. By another, Jews
having an university education were allowed freedom of
residence in any part of the empire. By others, greater
freedom was given to the Polish press, formerly forbidden to
discuss political questions; local assemblies of Polish nobles
were organized; permission was given to restore Roman Catholic
churches in Poland, and certain special Polish taxes were
removed.

RUSSIA: A. D. 1897 (February).

Census of the Empire.

"For the first time in the history of the Hyperborean Empire,

a general, and if I may use the expression, scientific, census
has been taken of the various tongues and tribes, religions
and sects, cultured races and nomadic hordes who acknowledge
the sway of the Tsar. It was a Herculean labour, without
precedent in history and without a formula in statistics. … On
June 5, 1895, the reigning Tsar gave his sanction to a scheme
which was both conformable to the exigencies of modern
statistics and suitable to the various conditions peculiar to
Russia. … The general plan of operations was simple, and
calculated as far as possible to impose a large portion of the
task upon officials of the Administration, and obviate the
necessity of paying for it. Thus there was a Committee in
every Government or Province of the Empire, presided over by
the actual Governor; and there were sub-committees in every
district under the direction of the Marshal of the Nobility. …
The task undertaken by the Central Committee was in the
highest degree formidable: rooted prejudices had to be
overcome, inarticulate suspicions removed—the half-civilised
nomads have an insuperable dislike to answer questions of the
'Tshinovniks'—the confidence of the people gained, languages