Textbook Encyclopedia of Plasma Technology Ii Microplasma Wool 1St Edition J Leon Shohet Ebook All Chapter PDF
Textbook Encyclopedia of Plasma Technology Ii Microplasma Wool 1St Edition J Leon Shohet Ebook All Chapter PDF
Textbook Encyclopedia of Plasma Technology Ii Microplasma Wool 1St Edition J Leon Shohet Ebook All Chapter PDF
https://textbookfull.com/product/encyclopedia-of-computer-
science-and-technology-second-edition-volume-ii-laplante/
https://textbookfull.com/product/encyclopedia-of-biological-
chemistry-2nd-edition-william-j-lennarz/
https://textbookfull.com/product/hydrogen-generation-from-
ethanol-using-plasma-reforming-technology-1st-edition-jianhua-
yan/
https://textbookfull.com/product/routledge-encyclopedia-of-
technology-and-the-humanities-1st-edition-chan-sin-wai/
The Plasma Chemistry of Polymer Surfaces Advanced
Techniques for Surface Design 1st Edition Friedrich J.
https://textbookfull.com/product/the-plasma-chemistry-of-polymer-
surfaces-advanced-techniques-for-surface-design-1st-edition-
friedrich-j/
https://textbookfull.com/product/encyclopedia-of-information-
science-and-technology-fifth-edition-mehdi-kosrow/
https://textbookfull.com/product/encyclopedia-of-nursing-
research-fourth-edition-edition-joyce-j-fitzpatrick-editor/
https://textbookfull.com/product/encyclopedia-of-information-
science-and-technology-4th-edition-mehdi-khosrow-pour/
https://textbookfull.com/product/encyclopedia-of-computer-
science-and-technology-second-edition-volume-i-laplante/
Downloaded by [University of California, San Diego] at 19:22 28 March 2017
Encyclopedia of
Plasma
Technology
Volume II
Microplasma—Wool
Encyclopedias from the Taylor & Francis Group
Print Online Print Online
Agriculture Engineering
Encyclopedia of Agricultural, Food, and Biological Engineering, Dekker Encyclopedia of Nanoscience and Nanotechnology,
2nd Ed., 2 Vols. Pub'd. 10/21/10 3rd Ed., 7 Vols. Pub'd. 3/20/14
K10554 (978-1-4398-1111-5) K11382 (978-1-4398-2806-9) K14119 (978-1-4398-9134-6) K14120 (978-1-4398-9135-3)
Encyclopedia of Animal Science, 2nd Ed., 2 Vols. Pub'd. 2/1/11 Encyclopedia of Energy Engineering and Technology, 2nd Ed.,
K10463 (978-1-4398-0932-7) K10528 (978-0-415-80286-4) 4 Vols. Pub'd. 12/1/14
Encyclopedia of Biotechnology in Agriculture and Food Pub'd. 7/16/10 K14633 (978-1-4665-0673-2) KE16142 (978-1-4665-0674-9)
DK271X (978-0-8493-5027-6) DKE5044 (978-0-8493-5044-3) Encyclopedia of Optical and Photonic Engineering, 2nd Ed.,
Encyclopedia of Pest Management Pub'd. 5/9/02 5 Vols. Pub'd. 9/22/15
DK6323 (978-0-8247-0632-6) DKE517X (978-0-8247-0517-6) K12323 (978-1-4398-5097-8) K12325 (978-1-4398-5099-2)
Plasma
Technology
Volume II
Microplasma—Wool
This book contains information obtained from authentic and highly regarded sources. Reasonable efforts have been
made to publish reliable data and information, but the author and publisher cannot assume responsibility for the
validity of all materials or the consequences of their use. The authors and publishers have attempted to trace the
copyright holders of all material reproduced in this publication and apologize to copyright holders if permission to
publish in this form has not been obtained. If any copyright material has not been acknowledged please write and let
us know so we may rectify in any future reprint.
Except as permitted under U.S. Copyright Law, no part of this book may be reprinted, reproduced, transmitted, or
utilized in any form by any electronic, mechanical, or other means, now known or hereafter invented, including pho-
tocopying, microfilming, and recording, or in any information storage or retrieval system, without written permis-
sion from the publishers.
For permission to photocopy or use material electronically from this work, please access www.copyright.com (http://
www.copyright.com/) or contact the Copyright Clearance Center, Inc. (CCC), 222 Rosewood Drive, Danvers, MA
01923, 978-750-8400. CCC is a not-for-profit organization that provides licenses and registration for a variety of
users. For organizations that have been granted a photocopy license by the CCC, a separate system of payment has
been arranged.
Trademark Notice: Product or corporate names may be trademarks or registered trademarks, and are used only for
identification and explanation without intent to infringe.
Visit the Taylor & Francis Web site at
http://www.taylorandfrancis.com
and the CRC Press Web site at
http://www.crcpress.com
Brief Contents
v
vi Brief Contents
J. Leon Shohet
Department of Electrical and Computer Engineering,
University of Wisconsin-Madison, Madison, Wisconsin, U.S.A.
Rod Boswell
Australian National University, Steven L. Girshick
Canberra, Australian Capital Territory, Professor of Mechanical Engineering,
Australia Graduate Faculty, Chemical Engineering,
Materials Science, Nanoparticle Science
and Engineering, and Director,
Raymond (Reuven) Boxman High Temperature and Plasma Laboratory,
Director, Electrical Discharge and University of Minnesota,
Plasma Laboratory, Kranzberg Chair of Plasma Minneapolis, Minnesota, U.S.A.
Engineering, Tel Aviv University, Tel Aviv, Israel
Steven J. Gitomer
Jane P. Chang Los Alamos National Lab, Los Alamos,
Electronic Materials Synthesis and New Mexico, U.S.A.
Plasma Processing Lab,
University of California—Los Angeles,
Los Angeles, California, U.S.A. Valery Godyak
RF Plasma Consulting, Brookline,
Massachusetts, U.S.A.
Pietro Favia
Department of Chemistry,
University of Bari and Plasma Solution, Richard Gottscho
Bari, Italy Lam Research, Fremont, California, U.S.A.
vii
viii Editor-in-Chief
Eduardo Ahedo / Space Propulsion and Plasma Team (EP2), Carlos III University of
Madrid, Leganes, Spain
Mari Aida / Tokyo Institute of Technology, Yokohama, Japan
Eser Metin Akinoglu / Department of Physics, Freie Universität Berlin (Free University of
Berlin), Berlin, and Max-Planck-Institut für Kolloid- und Grenzflächenforschung (Max
Planck Institute of Colloids and Interfaces), Potsdam, Germany
E. Amanatides / Department of Chemical Engineering, University of Patras, Patras,
Greece
Hiroshi Amemiya / Riken-obkai, Wakoshi, Japan
I.I. Amirov / Yaroslavl Branch of the Institute of Physics and Technology of Russian
Academy of Sciences, Yaroslavl, Russia
André Anders / Lawrence Berkeley National Laboratory, Berkeley, California, U.S.A.
Nikolay Andrianov / Svetlana-Rost JSC, Saint-Petersburg, Russia
V. Antonini / Institute of Biophysics, National Research Council, Trento, Italy
Johannes Arnold / Institute of Engineering Thermodynamics, German Aerospace
Center (DLR), Stuttgart, Germany
Gaelle Aziz / Department of Applied Physics, Ghent University, Ghent, Belgium
G. Bao / Department of Biomedical Engineering, Georgia Institute of Technology
and Emory University, Atlanta, Georgia, U.S.A.
Junwei Bao / Timbre Technologies, Inc., Fremont, California, U.S.A.
Yuri Barsukov / Samsung Electronics Co. Ltd, Suwon, Korea
Llorenç Bautista / Advanced Materials Group, Research and Development Department,
Leitat Technological Center, Terrassa, Spain
Diane Beauchemin / Department of Chemistry, Queen’s University, Kingston, Ontario,
Canada
Kurt H. Becker / Department of Applied Physics and Department of Mechanical and
Aerospace Engineering, Tandon School of Engineering, New York University, Brooklyn,
New York, U.S.A.
Jianzhong Bei / Beijing National Laboratory for Molecular Sciences (BNLMS), State Key
Laboratory of Polymer Physics and Chemistry, Institute of Chemistry, Chinese Academy of
Sciences, Beijing, China
Jan Benedikt / Faculty of Physics and Astronomy, Ruhr-University Bochum, Bochum,
Germany
Arijit Bera / Institute of Photonics, University of Eastern Finland, Joensuu, Finland
A. Berardinelli / Department of Agricultural and Food Sciences, University of Bologna,
Cesena, Italy
Anadi Bhatia / KLA-Tencor Corporation, Milpitas, California, U.S.A.
Daniel L. G. Borges / Chemistry Department, Federal University of Santa Catarina,
Florianópolis, Brazil
Edward Bormashenko / Physics Department, Ariel University, Ariel, Israel
Iain D. Boyd / Department of Aerospace Engineering, University of Michigan, Ann Arbor,
Michigan, U.S.A.
ix
x Contributors
Ronny Brandenburg / Leibniz Institute for Plasma Science and Technology (INP
Greifswald), Greifswald, Germany
Victor Breedveld / Georgia Institute of Technology, Atlanta, Georgia, U.S.A.
Graciela Brelles-Mariño / Center for Research and Development on Industrial
Fermentations (CINDEFI), National University of La Plata, La Plata, Argentina
Peter J. Bruggeman / Department of Mechanical Engineering, University of Minnesota,
Minneapolis, Minnesota, U.S.A.
Silvio Francisco Brunatto / Department of Mechanical Engineering, Federal University of
Paraná (UFPR), Curitiba, Brazil
C. Bueno-Ferrer / BioPlasma Research Group, School of Food Science and Environmental
Health, Dublin Institute of Technology, Dublin, Ireland
Victor Burdovitsin / Department of Physics, Tomsk State University of Control Systems
and Radioelectronics, Tomsk, Russia
Judit Buxadera-Palomero / Department of Materials Science and Metallurgical
Engineering, Technical University of Catalonia (BarcelonaTECH), Barcelona, Spain
Kerri Cahoy / Space Telecommunications, Astronomy, and Radiation Laboratory,
Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts, U.S.A.
Cecelia Campochiaro / KLA-Tencor Corporation, Milpitas, California, U.S.A.
Cristina Canal / Department of Materials Science and Metallurgical Engineering,
Technical University of Catalonia (BarcelonaTECH), Barcelona, Spain
Angela M. Capece / Department of Physics, The College of New Jersey, Ewing,
New Jersey, U.S.A.
Rodrigo Perito Cardoso / Department of Mechanical Engineering, Federal University of
Paraná (UFPR), Curitiba, Brazil
Olivier Carton / Laboratory of Condensed Matter Physics, University of Picardie Jules
Verne, Amiens, France
Vladimir Cech / Institute of Materials Chemistry, Brno University of Technology, Brno,
Czech Republic
Ke Vin Chan / Research Unit Plasma Technology (RUPT), Department of Applied Physics,
Faculty of Engineering and Architecture, Ghent University, Ghent, Belgium
Bhaskar Chaudhury / Dhirubhai Ambani Institute of Information and Communication
Technology (DA-IICT), Gandhinagar, Gujarat, India and Plasma and Energy Conversion
Laboratory (LAPLACE), University of Toulouse, Toulouse, France
Francis F. Chen / Electrical Engineering Department, University of California,
Los Angeles, Los Angeles, California, U.S.A.
Koichi Chiba / Kwansei Gakuin University, Sanda, Japan
Wonho Choe / Department of Physics, Korea Advanced Institute of Science and
Technology, Daejeon, Korea
Paul K. Chu / Department of Physics and Materials Science, City University of Hong Kong,
Hong Kong, China
Pieter Cools / Research Unit Plasma Technology (RUPT), Department of Applied Physics,
Ghent University, Ghent, Belgium
P.J. Cullen / BioPlasma Research Group, School of Food Science and Environmental Health,
Dublin Institute of Technology, Dublin, Ireland and School of Chemical Engineering,
University of New South Wales Australia, Sydney, New South Wales, Australia
M. Dalla Serra / Institute of Biophysics, National Research Council, Trento, Italy
Nathalie De Geyter / Research Unit Plasma Technology (RUPT), Department of Applied
Physics, Faculty of Engineering and Architecture, Ghent University, Ghent, Belgium
Contributors xi
O.F. Petrov / Moscow Institute of Physics and Technology, Dolgoprudny, and Joint Institute
for High Temperatures of the Russian Academy of Sciences (JHIT RAS), Moscow, Russia
and Center for Astrophysics, Space Physics, and Engineering Research (CASPER), Baylor
University, Waco, Texas, U.S.A.
Iris Pilch / Linköping University, Linköping, Sweden
Kurt A. Polzin / George C. Marshall Space Flight Center, National Aeronautics and Space
Administration (NASA), Huntsville, Alabama, U.S.A.
Maja Radetic / Faculty of Technology and Metallurgy, University of Belgrade, Belgrade,
Serbia
L. Ragni / Department of Agricultural and Food Sciences, University of Bologna, Cesena,
Italy
Jozef Ráhel / Department of Physical Electronics, Masaryk University, Brno, Czech
Republic
Shahid Rauf / Applied Materials, Inc., Sunnyvale, California, U.S.A.
F. Ren / Department of Chemical Engineering, University of Florida, Gainesville, Florida,
U.S.A.
He Ren / Applied Materials, Inc., Sunnyvale, California, U.S.A.
P. Rocculi / Department of Agricultural and Food Sciences, University of Bologna, Cesena,
Italy
Daniel Rodriguez / Department of Materials Science and Metallurgical Engineering,
Technical University of Catalonia (BarcelonaTECH), Barcelona, Spain
Matthieu Roussey / Institute of Photonics, University of Eastern Finland, Joensuu,
Finland
Robert Ruckdäschel / Institute of Engineering Thermodynamics, German Aerospace
Center (DLR), Stuttgart, Germany
Nausheen Sadiq / Department of Chemistry, Queen’s University, Kingston, Ontario, Canada
R.K. Sahu / Department of Mechanical Engineering, Indian Institute of Technology
Madras, Chennai, India
Tarek Salem / National Research Center (NRC), Cairo, Egypt and Leibniz Institute of
Polymer Research Dresden, Dresden, Germany
Jefferson Santos de Gois / Chemistry Department, Federal University of Santa Catarina,
Florianópolis, Brazil
Kostas Sarakinos / Linköping University, Linköping, Sweden
Mayur S. Sawant / Department of Mechanical Engineering, Indian Institute of Technology
Indore, Indore, India
Günter Schiller / Institute of Engineering Thermodynamics, German Aerospace Center
(DLR), Stuttgart, Germany
K.H. Schoenbach / Old Dominion University, Norfolk, Virginia, U.S.A.
Tony Schönherr / Department of Aeronautics and Astronautics, University of Tokyo,
Bunkyo, Japan
Dhaval B. Shah / Mechanical Engineering Department, Nirma University, Gujarat, India
Tao Shao / Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing,
China
A. Shashurin / School of Aeronautics and Astronautics, Purdue University, West Lafayette,
Indiana, U.S.A.
Hong Shen / Beijing National Laboratory for Molecular Sciences (BNLMS), State Key
Laboratory of Polymer Physics and Chemistry, Institute of Chemistry, Chinese Academy of
Sciences, Beijing, China
Contributors xvii
Volume I
Acrylates and Methacrylates: Radical Polymerization / Thierry Fouquet and Grégory Mertz . . . . 1
Amine Monomers: Plasma and Ultraviolet Polymerization / Gaelle Aziz, Ke Vin Chan,
Nathalie De Geyter, and Rino Morent . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 14
Antimicrobial Biomedical Materials: Engineering / Anton Nikiforov, Pieter Heyse,
Deng Xiaolong, and Christophe Leys . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 26
Arc Welding / C.S. Wu and C.B. Jia . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 36
Arc-Heated Wind Tunnels / Yusuke Takahashi . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 54
Atmospheric Pressure Plasmas: Apple Treatment / A. Berardinelli, S. Tappi, P. Rocculi, and
L. Ragni . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 66
Atmospheric Pressure Plasmas: Free-Radical Movements in / Jan Benedikt . . . . . . . . . . . . . . . . 73
Atmospheric Pressure Plasmas: Low-Temperature Processes / Hiroaki Kakiuchi,
Hiromasa Ohmi, and Kiyoshi Yasutake . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 82
Atmospheric Pressure Plasmas: Polymerization / Olivier Carton, Llorenç Bautista, and
Jose Garcia-Torres . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 92
Atmospheric Pressure Plasmas: Uniform Glow Discharge / Wonho Choe and Se Youn Moon . . . . 107
Atomic Layer Etching / S.U. Engelmann . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 128
Atomic Layer Etching: Directional / Thorsten Lill, Keren J. Kanarik, Samantha Tan,
Meihua Shen, Eric Hudson, Yang Pan, Jeffrey Marks, Vahid Vahedi, and Richard A. Gottscho . . . 133
Atomic Layer Re-Deposition for Nanoscale Devices / Markus Häyrinen, Matthieu Roussey,
Arijit Bera, Markku Kuittinen, and Seppo Honkanen . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 143
Beam Plasmas: Materials Production / Michael Vasiliev and Tatiana Vasilieva . . . . . . . . . . . . . . 152
Biology: Low-Temperature Plasmas in / Mohammed Yousfi . . . . . . . . . . . . . . . . . . . . . . . . . . . . 167
Biotechnology: Plasmas in / Andrew Michelmore, Jason D. Whittle, and Robert D. Short . . . . . . . 179
Blood Coagulation: Plasma Torch / Spencer P. Kuo . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 186
Boron Trichloride Dry Etching / Anton Kobelev, Nikolay Andrianov, Yuri Barsukov, and
Alexander Smirnov . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 193
Cancer Therapy: Cold Atmospheric Pressure Plasma: / Michael Keidar . . . . . . . . . . . . . . . . . . 203
Capacitively Coupled Plasmas: Electromagnetic Effects / Denis Eremin . . . . . . . . . . . . . . . . . . . 212
Carbon-Shunting Arc Plasmas / Koichi Takaki and Ken Yukimura . . . . . . . . . . . . . . . . . . . . . . . 228
CARS Diagnostics: High-Pressure Nonequilibrium Plasmas / Walter R. Lempert and
Aaron Montello . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 237
Cell Culture: Polymerization of PMMA for / Chuan Li and J.H. Hsieh . . . . . . . . . . . . . . . . . . . 248
Cellulose-Based Materials: Plasma Modification / Zhenguan Tang, Victor Breedveld, and
Dennis Hess . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 259
Coal Combustion: Plasma-Assisted / V.E. Messerle and A.B. Ustimenko . . . . . . . . . . . . . . . . . . . 269
Cold Atmospheric Pressure Plasma: Technology / A. Shashurin . . . . . . . . . . . . . . . . . . . . . . . . 284
xxi
xxii Contents
Volume I (cont’d.)
Combinatorial Plasma Polymerization: Carbon-Based Films / L. Minati, V. Antonini,
C. Pederzolli, M. Dalla Serra, G. Bao, and G. Speranza . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 294
DC Arc Plasma Torch with Nanocarbon-Coated Electrodes / V.E. Messerle and
A.B. Ustimenko . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 307
DC Plasma: Powder Metallurgy / Rodrigo Perito Cardoso, Henrique Cezar Pavanati,
Aloisio Nelmo Klein, and Silvio Francisco Brunatto . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 317
Dental Implants: Plasma Polymerization for / Judit Buxadera-Palomero, Cristina Canal,
F. Javier Gil, and Daniel Rodriguez . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 328
Die Singulation / Kenneth D. Mackenzie, David G. Lishan, Gordon M. Grivna, and
Jason M. Doub . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 339
Dielectric Barrier Discharge (DBD) / Ronny Brandenburg . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 355
Dielectric Barrier Discharge: Biomaterials / Pieter Cools, Stijn Van Vrekhem,
Nathalie De Geyter, and Rino Morent . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 367
Dielectric Barrier Discharge: Combustion / Fanying Meng and Yixiang Duan . . . . . . . . . . . . . . . 381
Dielectric Barrier Discharge: Compact Repetitive Unipolar Nanosecond-Pulse Generators /
Tao Shao and Cheng Zhang . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 388
Dielectric Barrier Discharge: Meat Treatment / Dinesh D. Jayasena, Hyun-Joo Kim, and
Cheorun Jo . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 395
Dispenser Hollow Cathode Discharges / Angela M. Capece . . . . . . . . . . . . . . . . . . . . . . . . . . . . 405
Dusty Plasma Liquid: Non-Newtonian Behavior / O.F. Petrov, A.S. Ivanov, and V.E. Fortov . . . . . 412
Electrical Discharge Machining (EDM): Casting Process Parameters / Serajul Haque . . . . . . . . 417
Electrical Discharge Machining (EDM): Nanoparticle Generation / R.K. Sahu and
Somashekhar S. Hiremath . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 432
Electrothermal Vaporization Inductively Coupled Plasma Mass Spectrometry
(ETV-ICP-MS) / Jefferson Santos de Gois and Daniel L. G. Borges . . . . . . . . . . . . . . . . . . . 443
Embryonic Stem Cells: Plasma-Directed Differentiation / Erik Hanley, Gary Lyons,
Jason Lauer, Bruce Micales, and J. Leon Shohet . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 452
Engine Emission Control: Ozone and Plasma Desorption / Marcin Hołub . . . . . . . . . . . . . . . . . 467
Etching: Endpoint Detection / Junwei Bao . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 476
Food Packaging / P.J. Cullen, S.K. Pankaj, and C. Bueno-Ferrer . . . . . . . . . . . . . . . . . . . . . . . . . 491
Gas-Discharge Plasma: Biofilm Inactivation / Graciela Brelles-Mariño . . . . . . . . . . . . . . . . . . . 498
Glass Fibers: Improved Interfacial Adhesion / Vladimir Cech . . . . . . . . . . . . . . . . . . . . . . . . . . 502
Gliding Arc Discharge: Combustion Enhancement / Timothy Ombrello and Yiguang Ju . . . . . . . 517
Glow Discharges: Stratification / Vladimir I. Kolobov . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 529
Graphene: Plasma Etching / Jian Sun and Hiroshi Mizuta . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 540
Helicon Source for Electric Propulsion / Francis F. Chen . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 549
High E/N Discharges: Applications / Andrey Starikovskiy . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 555
High-Power Impulse Magnetron Sputtering (HiPIMS) / André Anders . . . . . . . . . . . . . . . . . . . 588
High-Pressure Optical Diagnostics / Peter J. Bruggeman . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 603
Inductively Coupled Plasma Mass Spectrometry / Yoseif Makonnen, Nausheen Sadiq, and
Diane Beauchemin . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 623
Inductively Coupled Plasma Optical Emission Spectrometry / Farhad Kaveh, Lily Huang,
and Diane Beauchemin . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 655
Inductively Coupled Plasma Sputtering: Structure of IV-VI Semiconductors / S.P. Zimin,
E.S. Gorlachev, and I.I. Amirov . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 679
Kelvin Probe / H. Sinha, J. Lauer, M. Nichols, and J.L. Shohet . . . . . . . . . . . . . . . . . . . . . . . . . . 692
Laser-Induced Plasma / Alessandro De Giacomo and Marcella Dell’Aglio . . . . . . . . . . . . . . . . . . 696
Contents xxiii
Liquids and Gas-Liquid Environments: Plasmas in / M. Magureanu and V.I. Parvulescu ...... 702
Mercury Probe / H. Sinha and J.L. Shohet . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . ....... 716
Metal Deposition: Plasma-Based Processes / Neelesh K. Jain, Mayur S. Sawant,
Sagar H. Nikam, and Suyog Jhavar . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . ....... 722
Microdischarges / K.H. Schoenbach . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . ....... 741
Microorganisms: Destruction with Nonthermal Plasma / Nicolai S. Panikov . . . . . . . . ....... 758
Volume II
Microplasma Atomic Emission Spectroscopy / Takahiro Iwai, Ken Kakegawa, Mari Aida,
Yoichi Nagata, Hidekazu Miyahara, Koichi Chiba, and Akitoshi Okino . . . . . . . . . . . . . . . . . . .. 773
Microplasmas / Alan R. Hoskinson . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .. 780
Microplasmas: Environmental and Biological Applications / Kurt H. Becker, WeiDong Zhu,
and Jose L. Lopez . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .. 791
Microwave Plasmas: Single Crystal Diamond Synthesis / Kadek W. Hemawan and
Russell J. Hemley . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 806
Microwave-Generated Fireballs / Eli Jerby . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 819
Modeling: 2-D / Prashanth Kothnur . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 833
Modeling: Electromagnetic Plasma / Shahid Rauf . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 847
Nanocrystalline Diamond Coatings / Mei Wang and Paul K. Chu . . . . . . . . . . . . . . . . . . . . . . . . 857
Nanotechnology: Plasma-Based / Kostya (Ken) Ostrikov . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 874
Negative Ion and Dust Particle-Containing Plasmas / Robert L. Merlino . . . . . . . . . . . . . . . . . . 887
Negative Ion Plasmas / Hiroshi Amemiya . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 906
NOx: Removal by Plasma Catalytic Process / Xiaoming Zheng, Hui Wang, and Qinqin Yu . . . . . . 944
Opals (2-D Colloidal Crystals): Plasma Etching of / Eser Metin Akinoglu and Michael Giersig . . 953
Ozone Injection: Plasma-Induced / Takuya Kuwahara and Masaaki Okubo . . . . . . . . . . . . . . . . . 964
Paper: Plasma Deacidification / XiWen Zhang and QingLi Wang . . . . . . . . . . . . . . . . . . . . . . . . 974
PECVD: Silicon Nitride / Deborah Neumayer . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 982
Photonic Crystals: Tunable Plasma / Lifang Dong, Weili Fan, Xuechen Li, and Yuyang Pan . . . . . 993
Plasma Bullets / Mounir Laroussi . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 997
Plasma Electron Sources / Victor Burdovitsin and Efim Oks . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1006
Plasma Flow Control / Yun Wu and Yinghong Li . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1016
Plasma Impedance in Discharges / N. Spiliopoulos and E. Amanatides . . . . . . . . . . . . . . . . . . . . 1038
Plasmonics and Surface Plasmons / Mikhail A. Kats, Yu Yao, and Chao Wang . . . . . . . . . . . . . . . 1062
PLGA: Immobilization of Fibroblast Growth Factor / Shenguo Wang, Hong Shen, Xixue Hu,
Fei Yang, and Jianzhong Bei . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .. 1083
Pollutants: Aqueous Organic, Nonthermal Degradation / P. Manoj Kumar Reddy and
Ch. Subrahmanyam . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .. 1087
Polymer Surface Modification: Plasma for Applications / Dimitrios Kontziampasis and
Maria Kitsara . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .. 1097
Polymer–Cold Plasma Interactions / Edward Bormashenko . . . . . . . . . . . . . . . . . . . . . . . . . . .. 1108
Polymeric Microfluidics: Fabricated and Modified Using Plasmas / Katerina Tsougeni,
Angeliki Tserepi, and Evangelos Gogolides . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .. 1112
Polymers: Plasma Micro-Nanotexturing and Plasma-Directed Organization /
Dimitrios Kontziampasis, Angeliki Tserepi, and Evangelos Gogolides . . . . . . . . . . . . . . . . . . . .. 1125
Polyolefin Surfaces: Functional Groups / Jörg Friedrich and Gundula Hidde . . . . . . . . . . . . . .. 1138
Powders: Plasma Spray PVD for High-Throughput Production / Makoto Kambara,
Tasuku Hideshima, Mashiro Kaga, and Toyonobu Yoshida . . . . . . . . . . . . . . . . . . . . . . . . . . .. 1176
Pulsed Inductive Plasma Acceleration: Optimization / Kurt A. Polzin . . . . . . . . . . . . . . . . . . .. 1191
xxiv Contents
Volume II (cont’d.)
Pulsed Plasmas: Nanoparticles and Thin Film Synthesis / Iris Pilch and Kostas Sarakinos . . . . . 1201
Quantum Plasmas / Fernando Haas . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1216
Radar Cross-Section Reduction: Stealth Technology / Bhaskar Chaudhury . . . . . . . . . . . . . . . . . 1224
Re-Entry Vehicles: Communication through Plasma / Minkwan Kim . . . . . . . . . . . . . . . . . . . . . 1236
Root Canal Treatment / XinPei Lu . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1249
Scanning Electron Microscopy / Harsh Sinha, Anadi Bhatia, Hong Xiao, Olivier Moreau,
Paul MacDonald, and Cecelia Campochiaro . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1255
Seed Treatment: Cold Plasma / Yuan-Hua Dong, Jian-Gang Li, and Ling Li . . . . . . . . . . . . . . . . 1269
Semiconductor (III-V) Thin Films: Plasma Etching / S.J. Pearton and F. Ren . . . . . . . . . . . . . . 1271
Semiconductor-Bridge Plasma / Lin Zhang, Shunguan Zhu, Hongyan Feng, and Peng Ma . . . . . . 1280
Semiconductors: Etching with Sulfur Hexafluoride (SF6) / Chalermwat Wongwanitwattana . . . . . 1288
Sewage Sludge: Plasma Gasification of / Antonios John Mountouris . . . . . . . . . . . . . . . . . . . . . . 1295
Shadow Mask Plasma Display Panel / Yan Tu, Baoping Wang, Xiong Zhang, Lanlan Yang,
Qing Li, and Yongming Tang . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1305
Solid Oxide Fuel Cells (SOFC): Advanced Production Techniques / Rudolf Henne,
Johannes Arnold, Robert Ruckdäschel, Günter Schiller . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1314
Space Plasma Thrusters: Magnetic Nozzles for / Mario Merino and Eduardo Ahedo . . . . . . . . . . 1329
Spacecraft Charging / Shu T. Lai and Kerri Cahoy . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1352
Steam Reforming / Gerardo Diaz . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1367
Strip Hollow Cathode Plasmas: PECVD and Thermochemical Treatment / Krasimir Nikolov
and Claus-Peter Klages . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1376
Taguchi Method: Plasma Cutting Parameters / Dhaval B. Shah, Shashikant Joshi, and
Ashil Patel . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1389
Textiles / Maja Radetic . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1396
Textiles: Nanostructured Plasma Coatings / Dirk Hegemann . . . . . . . . . . . . . . . . . . . . . . . . . . . 1408
Textiles: PET, Poly-DADMAC-Containing Fabrics / Tarek Salem . . . . . . . . . . . . . . . . . . . . . . . 1417
Thermal Plasmas: Boundary Conditions on Heat Flux / L. Pekker . . . . . . . . . . . . . . . . . . . . . . 1424
Thin Films: Polyaniline and Poly(3-methylthiophene) / G.B.V.S. Lakshmi, Shumaila,
Sameen Ahmed Khan, and Azher M. Siddiqui . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1442
Thrusters: Ablative Pulsed, Plasma Acceleration in / Tony Schönherr . . . . . . . . . . . . . . . . . . . . 1452
Thrusters: Current-Free Plasma / Kazunori Takahashi . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1462
Thrusters: Iodine Plasma / James Szabo . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1474
Thrusters: Pulsed Plasmas / Iain D. Boyd . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1484
Vacuum Arc Cathode Spots / André Anders . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1492
Vacuum Ultraviolet (VUV) Sources / He Ren . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1499
Volatile Organic Compounds Decomposition / Hyun-Ha Kim, Yoshiyuki Teramoto,
Nobuaki Negishi, and Atsushi Ogata . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1504
Wafer Movement and Micro-Arc Discharges: Detection / Yuji Kasashima, Tatsuo Tabaru,
Mitsuo Yasaka, and Fumihiko Uesugi . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1517
Wide Bandgap Materials: Plasma Etching / Huseyin Ekinci . . . . . . . . . . . . . . . . . . . . . . . . . . . 1530
Wood Surfaces: Plasma Activation / Jozef Ráhel and Radovan Tiňo . . . . . . . . . . . . . . . . . . . . . . 1541
Wool: Low-Temperature Plasma Treatment of / Chi-wai Kan . . . . . . . . . . . . . . . . . . . . . . . . . . 1552
Topical Table of Contents
Aerospace
High E/N Discharges: Applications / Andrey Starikovskiy . . . . . . . . . . . . . . . . . . . . . . . . . . . 555
Radar Cross-Section Reduction: Stealth Technology / Bhaskar Chaudhury . . . . . . . . . . . . . . 1224
Spacecraft
Re-Entry Vehicles: Communication through Plasma / Minkwan Kim . . . . . . . . . . . . . . . . . . 1236
Spacecraft Charging / Shu T. Lai and Kerri Cahoy . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1352
Thrusters
Helicon Source for Electric Propulsion / Francis F. Chen . . . . . . . . . . . . . . . . . . . . . . . . . . 549
Pulsed Inductive Plasma Acceleration: Optimization / Kurt A. Polzin . . . . . . . . . . . . . . . . . 1191
Thrusters: Ablative Pulsed, Plasma Acceleration in / Tony Schönherr . . . . . . . . . . . . . . . . . 1452
Thrusters: Current-Free Plasma / Kazunori Takahashi . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1462
Thrusters: Iodine Plasma / James Szabo . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1474
Thrusters: Pulsed Plasmas / Iain D. Boyd . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1484
Space Plasma Thrusters: Magnetic Nozzles for / Mario Merino and Eduardo Ahedo . . . . . . . 1329
Biology
Antimicrobial (Inhibitory) Applications
Antimicrobial Biomedical Materials: Engineering / Anton Nikiforov, Pieter Heyse,
Deng Xiaolong, and Christophe Leys . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 26
Biology: Low-Temperature Plasmas in / Mohammed Yousfi . . . . . . . . . . . . . . . . . . . . . . . . . 167
Food Packaging / P.J. Cullen, S.K. Pankaj, and C. Bueno-Ferrer . . . . . . . . . . . . . . . . . . . . . . 491
Gas-Discharge Plasma: Biofilm Inactivation / Graciela Brelles-Mariño . . . . . . . . . . . . . . . . 498
Microorganisms: Destruction with Nonthermal Plasma / Nicolai S. Panikov . . . . . . . . . . . . 758
Pollutants: Aqueous Organic, Nonthermal Degradation / P. Manoj Kumar Reddy and
Ch. Subrahmanyam . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . ..... 1087
xxv
xxvi Topical Table of Contents
Biology (cont’d.)
Technology
Biotechnology: Plasmas in / Andrew Michelmore, Jason D. Whittle, and Robert D. Short . . . . 179
Seed Treatment: Cold Plasma / Yuan-Hua Dong, Jian-Gang Li, and Ling Li . . . . . . . . . . . . . 1269
Human Health
Blood Coagulation: Plasma Torch / Spencer P. Kuo . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 186
Cancer Therapy: Cold Atmospheric Pressure Plasma: / Michael Keidar . . . . . . . . . . . . . . . 203
Cell Culture: Polymerization of PMMA for / Chuan Li and J.H. Hsieh . . . . . . . . . . . . . . . . 248
Cold Atmospheric Pressure Plasma: Technology / A. Shashurin . . . . . . . . . . . . . . . . . . . . . 284
Dental Implants: Plasma Polymerization for / Judit Buxadera-Palomero, Cristina Canal,
F. Javier Gil, and Daniel Rodriguez . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 328
Embryonic Stem Cells: Plasma-Directed Differentiation / Erik Hanley, Gary Lyons,
Jason Lauer, Bruce Micales, and J. Leon Shohet . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 452
Plasmonics and Surface Plasmons / Mikhail A. Kats, Yu Yao, and Chao Wang . . . . . . . . . . . . 1062
PLGA: Immobilization of Fibroblast Growth Factor / Shenguo Wang, Hong Shen, Xixue Hu,
Fei Yang, and Jianzhong Bei . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1083
Root Canal Treatment / XinPei Lu . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1249
Chemistry
Beam Plasmas: Materials Production / Michael Vasiliev and Tatiana Vasilieva . . . . . . . . . . . 152
DC Plasma: Powder Metallurgy / Rodrigo Perito Cardoso, Henrique Cezar Pavanati,
Aloisio Nelmo Klein, and Silvio Francisco Brunatto . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 317
Steam Reforming / G. Diaz . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1367
Combustion
Coal Combustion: Plasma-Assisted / V.E. Messerle and A.B. Ustimenko . . . . . . . . . . . . . . . . 269
Dielectric Barrier Discharge: Combustion / Fanying Meng and Yixiang Duan . . . . . . . . . . . . 381
Engine Emission Control: Ozone and Plasma Desorption / Marcin Holub . . . . . . . . . . . . . . 467
Gliding Arc Discharge: Combustion Enhancement / Timothy Ombrello and Yiguang Ju . . . . 517
Ozone Injection: Plasma-Induced / Takuya Kuwahara and Masaaki Okubo . . . . . . . . . . . . . . 964
Semiconductor-Bridge Plasma / Lin Zhang, Shunguan Zhu, Hongyan Feng, and Peng Ma . . . 1280
Solid Oxide Fuel Cells (SOFC): Advanced Production Techniques / Rudolf Henne,
Johannes Arnold, Robert Ruckdäschel, and Günter Schiller . . . . . . . . . . . . . . . . . . . . . . . ... 1314
Control Systems
Plasma Flow Control / Yun Wu and Yinghong Li . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1016
Topical Table of Contents xxvii
Deposition
Atomic Layer Re-Deposition for Nanoscale Devices / Markus Häyrinen, Matthieu Roussey,
Arijit Bera, Markku Kuittinen, and Seppo Honkanen . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 143
Glass Fibers: Improved Interfacial Adhesion / Vladimir Cech . . . . . . . . . . . . . . . . . . . . . . . 502
Metal Deposition: Plasma-Based Processes / Neelesh K. Jain, Mayur S. Sawant, Sagar H. Nikam,
and Suyog Jhavar . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 722
PECVD: Silicon Nitride / Deborah Neumayer . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 982
Strip Hollow Cathode Plasmas: PECVD and Thermochemical Treatment / Krasimir Nikolov
and Claus-Peter Klages . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1376
Diagnostics
High-Pressure Optical Diagnostics / Peter J. Bruggeman . . . . . . . . . . . . . . . . . . . . . . . . . . . 603
Inductively Coupled Plasma Optical Emission Spectrometry / Farhad Kaveh, Lily Huang, and
Diane Beauchemin . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 655
Mass Spectrometry
Inductively Coupled Plasma Mass Spectrometry / Yoseif Makonnen, Nausheen Sadiq, and
Diane Beauchemin . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 623
Electrothermal Vaporization Inductively Coupled Plasma Mass Spectrometry
(ETV-ICP-MS) / Jefferson Santos de Gois and Daniel L.G. Borges . . . . . . . . . . . . . . . . . 443
Spectroscopy
Microplasma Atomic Emission Spectroscopy / Takahiro Iwai, Ken Kakegawa, Mari Aida,
Yoichi Nagata, Hidekazu Miyahara, Koichi Chiba, and Akitoshi Okino . . . . . . . . . . . . . . . . . . 773
Surface Measurements
Kelvin Probe / H. Sinha, J. Lauer , M. Nichols, and J. Leon Shohet . . . . . . . . . . . . . . . . . . . . 692
Mercury Probe / H. Sinha and J. Leon Shohet . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 716
Scanning Electron Microscopy / Harsh Sinha, Anadi Bhatia, Hong Xiao, Olivier Moreau,
Paul MacDonald, and Cecelia Campochiaro . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1255
Dusty Plasmas
Dusty Plasma Liquid: Non-Newtonian Behavior / O.F. Petrov, A.S. Ivanov, and
V.E. Fortov . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 412
Negative Ion and Dust Particle-Containing Plasmas / Robert L. Merlino . . . . . . . . . . . . . . . 887
Environment
NOx: Removal by Plasma Catalytic Process / Xiaoming Zheng, Hui Wang, and Qinqin Yu . . . 944
Waste
Sewage Sludge: Plasma Gasification of / Antonios John Mountouris . . . . . . . . . . . . . . . . . . . 1295
xxviii Topical Table of Contents
Etching
Atomic Layer Etching / Sebastian U. Engelmann . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 128
Atomic Layer Etching: Directional / Thorsten Lill, Keren J. Kanarik, Samantha Tan,
Meihua Shen, Eric Hudson, Yang Pan, Jeffrey Marks, Vahid Vahedi, and
Richard A. Gottscho . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 133
Boron Trichloride Dry Etching / Anton Kobelev, Nikolay Andrianov, Yuri Barsukov, and
Alexander Smirnov . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 193
Etching: Endpoint Detection / Junwei Bao . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 476
Graphene: Plasma Etching / Jian Sun and Hiroshi Mizuta . . . . . . . . . . . . . . . . . . . . . . . . . . 540
Opals (2-D Colloidal Crystals): Plasma Etching of / Eser Metin Akinoglu and Michael Giersig 953
Semiconductor (III-V) Thin Films: Plasma Etching / S.J. Pearton and F. Ren . . . . . . . . . . . 1271
Semiconductors: Etching with Sulfur Hexafluoride (SF6) / Chalermwat Wongwanitwattana . . . 1288
Wafer Movement and Micro-Arc Discharges: Detection / Yuji Kasashima, Tatsuo Tabaru,
Mitsuo Yasaka, and Fumihiko Uesugi . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1517
Wide Bandgap Materials: Plasma Etching / Huseyin Ekinci . . . . . . . . . . . . . . . . . . . . . . . . 1530
Fundamentals
Capacitively Coupled Plasmas: Electromagnetic Effects / Denis Eremin . . . . . . . . . . . . . . . . 212
Laser-Induced Plasma / Alessandro De Giacomo and Marcella Dell’Aglio . . . . . . . . . . . . . . . 696
Negative Ion Plasmas / Hiroshi Amemiya . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 906
Plasma Impedance in Discharges / N. Spiliopoulos and E. Amanatides . . . . . . . . . . . . . . . . . 1038
Plasmonics and Surface Plasmons / Mikhail A. Kats, Yu Yao, and Chao Wang . . . . . . . . . . . . 1062
Quantum Plasmas / Fernando Haas . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1216
Materials Processing
Photonic Crystals: Tunable Plasma / Lifang Dong, Weili Fan, Xuechen Li, and Yuyang Pan . . . 993
Microfabrication
Beam Plasmas: Materials Production / Michael Vasiliev and Tatiana Vasilieva . . . . . . . . . . . 152
Microwave
Microwave-Generated Fireballs / Eli Jerby . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 819
Microwave Plasmas: Single Crystal Diamond Synthesis / Kadek W. Hemawan and
Russell J. Hemley . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 806
Modeling
Modeling: 2-D / Prashanth Kothnur . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 833
Modeling: Electromagnetic Plasma / Shahid Rauf . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 847
Plasma Devices
Atomic Layer Re-Deposition for Nanoscale Devices / Markus Häyrinen, Matthieu Roussey,
Arijit Bera, Markku Kuittinen, and Seppo Honkanen . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 143
Die Singulation / Kenneth D. Mackenzie, David G. Lishan, Gordon M. Grivna, and Jason M. Doub 339
Displays
Shadow Mask Plasma Display Panel / Yan Tu, Baoping Wang, Xiong Zhang, Lanlan Yang,
Qing Li, and Yongming Tang . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1305
Another random document with
no related content on Scribd:
PULLMAN.
Q.
QUEBEC, Province.
QUEENS COUNTY:
Incorporation in Greater New York.
QUEENSLAND.
R.
"A line now [1899] runs northward from Cape Town to Bulawayo,
in Rhodesia, a distance of 1,360 miles, and is being pushed
still farther northward. From Bulawayo to Lake Tanganyika is
about 1,000 miles; and this Mr. Rhodes hopes to reach by 1905.
Lake Tanganyika is 410 miles long; and it is likely that its
waters will be utilized for a time at least for transferring
northwardly the freights and passengers reaching its southern
end. Meantime the railroad from Cairo is being pushed
southwardly to meet the line which is coming from the Cape
northwardly. It has already been constructed to Atbara, where
American contractors have just finished the steel bridge in a
time which British bridge-builders considered impossible; and
the line is being pushed forward to Khartoum from that point.
Khartoum is 1,300 miles from Cairo; so that when work on the
section from Atbara to Khartoum is completed, as it will be
within a few months, the two gaps to be filled in will be from
Khartoum to the north end of Lake Tanganyika, a distance of
1,700 miles, and the 950 miles from the south end of Lake
Tanganyika to Bulawayo; i. e., 2,700 miles in all. Thus, of
the necessary land length, assuming that at least the 410
miles length of Lake Tanganyika will be at first utilized,
about one-half will be finished on the completion of the
section from Atbara to Khartoum, within the next few months.
The remaining 2,700 miles will, it is estimated, cost
$60,000,000; and Mr. Rhodes confidently predicts its
completion before the year 1910."
O. P. Austin,
Africa: Present and Future
(Forum, December, 1899).
Built. Proposed.
Total.
United States. 2,094 …
2,094
Mexico 1,183 461
1,644
---------
Guatemala. 43 126
169
San Salvador. 64 166
230
Honduras. … 71
71
Nicaragua. 103 106
209
Costa Rica. … 360
360
Colombia. … 1,354
1,354
Ecuador. … 658
658
Peru. 151 1,833
1,784
Bolivia. 195 392
587
Argentina. 936 125
1,061
See, above,
RAILWAY, INTERCONTINENTAL.
RAILWAY, Trans-Siberian.
RAILWAYS: in Africa.
RAILWAYS:
Russian projects in Persia.
See (in this volume)
RUSSIA IN ASIA: A. D. 1900.
{422}
RAILWAYS:
State purchase in Switzerland.
RANAVALOMANJAKA, Queen.
RECIPROCITY:
Treaties under the Dingley Tariff Act.
REFERENDUM, The:
In Minnesota.
REFERENDUM, The:
Introduction in South Dakota.
REFERENDUM, The:
Its exercise in Switzerland.
REPRESENTATIVES:
Reapportionment in the Congress of the United States.
RESERVOIRS, Nile.
RHODESIA: A. D. 1897.
Report on compulsory native labor.
RHODESIA: A. D. 1898.
Reorganized administration.
See (in this volume)
SOUTH AFRICA
(RHODESIA AND THE BRITISH SOUTH AFRICA COMPANY):
A. D. 1898 (FEBRUARY).
RHODESIA: A. D. 1900.
Protectorate proclaimed over Barotsiland.
ROMAN CATHOLICS:
Protest of British Peers against the
Declaration required from the Sovereign.
{423}
ROMAN CATHOLICS:
Victory in Belgium.
ROMAN LAW:
Superseded in Germany.
ROME:
The likeness of its early settlement shown by excavations
at Antemnæ.
ROOSEVELT, Theodore:
Elected Vice President of the United States.
ROUMANIA.
RUMANIA.
RUSSIA: A. D. 1895.
Agreement with Great Britain concerning the frontier of
Afghanistan and spheres of influence in the Pamir region.
RUSSIA: A. D. 1895.
Alliance with France.
RUSSIA: A. D. 1895.
Treaty with China giving railway and other privileges and
rights in Manchuria.
RUSSIA: A. D. 1897.
Relaxations of oppressive laws.
Several important relaxations of oppressive laws were
commanded by the Tzar in the course of the year. By one, sons
of the marriage of an orthodox Russian with one of another
creed were allowed to be brought up in the religion of the
father and daughters in that of the mother. By another, Jews
having an university education were allowed freedom of
residence in any part of the empire. By others, greater
freedom was given to the Polish press, formerly forbidden to
discuss political questions; local assemblies of Polish nobles
were organized; permission was given to restore Roman Catholic
churches in Poland, and certain special Polish taxes were
removed.