Tap Cell Insertion: Chip Finishing
Tap Cell Insertion: Chip Finishing
Tap Cell Insertion: Chip Finishing
Chip Finishing
IC Compiler II
August 2019
CONFIDENTIAL INFORMATION
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information of Synopsys. You are not permitted to disseminate or use any of
the information provided to you in this presentation outside of Synopsys
without prior written authorization.
IMPORTANT NOTICE
In the event information in this presentation reflects Synopsys’ future plans, such plans
are as of the date of this presentation and are subject to change. Synopsys is not
obligated to update this presentation or develop the products with the features and
functionality discussed in this presentation. Additionally, Synopsys’ services and products
may only be offered and purchased pursuant to an authorized quote and purchase order
or a mutually agreed upon written contract with Synopsys.
-distance tap_cell_distance
– Specifies the distance in microns between two tap cells in a row. This distance is referred to as the tap distance.
– This is a required option.
-voltage_area {va_collection}
– Specifies the voltage areas in which to create tap cells.
– By default, the command creates tap cells in all voltage areas.
-offset distance
– Specifies the distance in microns that the tap pattern should be shifted to the right. If the offset distance is a multiple of the
tap distance, the effective offset is 0. For example, if the tap distance is 10 microns and the offset is 32 microns, the effective
offset is 2 (32 - 3x10).
– The default is 0.
– every_other_row
– The command adds tap cells to every other row for odd rows only. This reduces the number of required tap cells by
approximately half as compared to the normal pattern.
– The tap distance specified for this pattern should be approximately twice the design rule distance limit.
– stagger
– The command adds tap cells to every row. The tap cells on even rows are offset with half the tap distance relative to the odd
rows, producing a checkerboard-like pattern. This pattern also reduces the number of required tap cells by approximately half
as compared to the normal pattern.
– The tap distance specified for this pattern should be approximately four times the design rule distance limit.
-prefix tap_cell_prefix
– Specifies the prefix for the created tap cells. When you use this option, the command uses the following
naming convention for the inserted tap cells:
tapfiller!cell_prefix!lib_cell!number
-separator tap_cell_separator
– Specifies the separator character that is used when composing the instance name of the tap cell.
– The default is "!".
• The -mirrored_row_lib_cell option specifies the library reference cell to use as a tap cell on
mirrored rows
– Mirrored rows are rows whose row orientation is set to MX rather than R0
– You can specify only a single library cell
– If you do not use this option, the cell specified with the -lib_cell option is used on mirrored rows
cellA51 cellA52
50 cellB41 cellB42
L cellA31 cellA32 R
Row with 100
MX orientation
cellB21 cellB22 d
cellA11 cellA22
cellA31 cellA32
99.978
L R
cellB21 cellB22
cellA11 cellA22
-no_abutment_horizontal_spacing number_of_unit_tiles
Horizontal spacing for no abutment
-no_abutment_corner_spacing number_of_unit_tiles
Horizontal corner spacing for no abutment
-no_abutment_cells lib_cells
When this option is specified, tap cells cannot abut the cells specified in this option
• Within the specified region, the command performs the Dense tap cell insertion
following tasks: create_dense_tap_cells
– Deletes the existing tap cells
– Reinserts the tap cells using the pitch specified with the Standard cell placement
-distance or -isn_layer_distance option
– Marks the inserted tap cells as fixed
Routing
• You can also perform dense tap cell insertion in
intensified substrate noise (ISN) regions by using the
-isn_layer or -isn_layer_distance option
Standard cell
core area
Noisy
IP or macro Noise sources
ISN rectangles
created by the user
© 2019 Synopsys, Inc. 19
ISN Area Tap Cell Creation
ISN rectangles
Horizontal wall tap spacing
Bdry Bdry Bdry Bdry Bdry Bdry Bdry Bdry Bdry Bdry Bdry Bdry
Cell Cell Cell Cell Cell Cell Cell Cell Cell Cell Cell Cell
Bdry Wall Wall Reg Bdry
Cell Tap Tap Tap Cell
Horizontal tap
Bdry Reg Bdry
wall (row of Wall Dense Dense
Cell Tap Tap Tap Tap Cell
tap cells)
Bdry Wall Dense Reg Bdry
Cell Tap Tap Tap Cell
Bdry Wall Dense ISN dense Dense Reg Bdry
Tap Tap tap cell area Tap Cell
Cell Tap
ILLEGAL!
Routing
-distance tap_cell_distance
– Specifies the distance in microns between two tap cells in a row. This distance is referred to as the tap
distance. This is a required option.
-offset distance
– Specifies the distance in microns that the tap pattern should be shifted to the right. If the offset distance is a
multiple of the tap distance, the effective offset is 0. For example, if the tap distance is 10 microns and the
offset is 32 microns, the effective offset is 2 (32 - 3x10). The default is 0.
-skip_fixed_cells
– Prevents the tool from creating tap cells in locations that are occupied by fixed cells.
-prefix tap_cell_prefix
– Specifies the prefix for the created tap cells. By default, no prefix is added.
-separator tap_cell_separator
– Specifies the separator character that is used when composing the instance name of the tap cell. The
default is "!".
-boundary_lib_cell cell_name
– Specifies the library cell used to create vertical and horizontal tap walls along the boundary of the placeable
area. If not specified, the cell specified in -lib_cell is used.
-horizontal_boundary_spacing x_value
– Specifies the spacing value in microns between two cells of a horizontal tap wall. The default is 0.
• -left_boundary_flipped
– Specifies that the cells of tap walls on the left boundary are flipped.
• -right_boundary_flipped
– Specifies that the cells of tap walls on the right boundary are flipped.
• Consult your foundry or library vendor for the rule usage and follow their recommendations for
DRC-free insertion